Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIK1 | P39086 | 1/20 | 0.42 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.42 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | EP300 | Q09472 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7536216 | 1.00 | GRIK1 (0.42) | GRIK1GRIK2TRPA1MAPK1PTGS1 | |
| SCHEMBL14607966 | 0.89 | GRIK1 (0.39) | GRIK1GRIK2TRPA1MAPK1 | |
| SCHEMBL7014840 | 0.87 | GRIK1 (0.38) | GRIK1GRIK2 | |
| SCHEMBL7014845 | 0.87 | GRIK1 (0.38) | GRIK1GRIK2 | |
| SCHEMBL24532073 | 0.81 | GRIK1 (0.38) | GRIK1GRIK2 | |
| SCHEMBL29036630 | 0.78 | — | — | |
| SCHEMBL19089794 | 0.78 | GRIK1 (0.33) | GRIK1GRIK2 | |
| SCHEMBL14562262 | 0.78 | ALDH1A1 (0.31) | GRIK1GRIK2ALDH1A1 | |
| SCHEMBL13126254 | 0.78 | GRIK1 (0.33) | GRIK1GRIK2 | |
| SCHEMBL18500782 | 0.78 | GRIK1 (0.40) | GRIK1GRIK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4101326-A | Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters | EASTMAN KODAK COMPANY (US) | 1978-07-18 | — | — | US | claimed |
| EP-0849636-B1 | Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element | KODAK POLYCHROME GRAPHICS CO (US) | 2002-04-10 | — | — | EP | disclosed |
| US-6270945-B1 | BLEND OF PHOTOPOLYMERIZABLE POLYMER AND DYE | KODAK POLYCHROME GRAPHICS, LLC | 2001-08-07 | — | — | US | disclosed |
| US-5962189-A | Photosensitive composition containing photosensitive polyamide and thiazoline photoinitiator and negative working photosensitive element | KODAK POLYCHROME GRAPHICS LLC (US) | 1999-10-05 | — | — | US | disclosed |
| US-5925498-A | Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates | KODAK POLYCHROME GRAPHICS LLC (US) | 1999-07-20 | — | — | US | disclosed |
| US-5879858-A | COMPOSITION COMPRISING RESIN CONTAINING UNSATURATED PHOTOCROSSLINKABLE GROUPS, PHOTOPOLYMERIZABLE MONOMER, PHOTOCROSSLINKABLE POLYESTER RESIN, PHOTOINITIATOR | KODAK POLYCHROME GRAPHICS, LLC (US) | 1999-03-09 | — | — | US | disclosed |
| WO-1998058296-A1 | PHOTOSENSITIVE POLYMER COMPOSITION AND ELEMENT CONTAINING PHOTOSENSITIVE POLYAMIDE AND MIXTURE OF ACRYLATES | KODAK POLYCHROME GRAPHICS, L.L.C. (US) | 1998-12-23 | — | — | WO | disclosed |
| US-5821032-A | A PHOTOCURABLE FORMULATION CONTAINS ETHYLENICALLY UNSATURATED PHOTOCROSSLINKABLE GROUPS, AN ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE MONOMER, A CROSSLINKABLE POLYESTER, CROSSLINKABLE STYRENE-MALEIC ANHYDRIDE AND PHOTOINITIATOR | KODAK POLYCHROME GRAPHICS, LLC (US) | 1998-10-13 | — | — | US | disclosed |
| EP-0849636-A1 | Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element | EASTMAN KODAK COMPANY (US) | 1998-06-24 | — | — | EP | disclosed |
| EP-0576622-B1 | LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK CO (US) | 1997-11-05 | — | — | EP | disclosed |
| US-4647346-A | IMPROVED ABRASION RESISTANCE | EASTMAN KODAK COMPANY (US) | 1987-03-03 | — | — | US | disclosed |
| US-4640886-A | ANODIZED, SILICATED ALUMINUM SUPPORT, RADIATION SENSITIVE POLYESTER, BENZOIC ACID LAYERS TO IMPROVE INCUBATION STABILITY | EASTMAN KODAK COMPANY (US) | 1987-02-03 | — | — | US | disclosed |
| EP-0199467-A1 | Polyesters comprising recurring photoconductive and photocrosslinkable units and elements thereof | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1986-10-29 | — | — | EP | disclosed |
| US-4609606-A | LITHOGRAPHIC PRINTING PLATES | EASTMAN KODAK COMPANY (US) | 1986-09-02 | — | — | US | disclosed |
| EP-0070898-B1 | IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1985-10-16 | — | — | EP | disclosed |
| US-4419437-A | SULFONIMIDE-CONTAINING AROMATIC DICARBOXYLIC ACID | EASTMAN KODAK COMPANY (US) | 1983-12-06 | — | — | US | disclosed |
| EP-0070898-A4 | IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS. | EASTMAN KODAK CO (US) | 1983-07-04 | — | — | EP | disclosed |
| EP-0070898-A1 | IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS. | EASTMAN KODAK CO (US) | 1983-02-09 | — | — | EP | disclosed |
| WO-1982002780-A1 | IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS | EASTMAN KODAK CO (US) | 1982-08-19 | — | — | WO | disclosed |
| US-4101326-A | Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters | EASTMAN KODAK COMPANY (US) | 1978-07-18 | — | — | US | disclosed |