Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPL | P06858 | 2/20 | 0.51 |
| ▸ | LIPG | Q9Y5X9 | 2/20 | 0.51 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.49 |
| ▸ | PPARA | Q07869 | 4/20 | 0.48 |
| ▸ | PPARG | P37231 | 3/20 | 0.48 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.47 |
| ▸ | MEF2D | Q14814 | 1/20 | 0.47 |
| ▸ | DRD2 | P14416 | 1/20 | 0.44 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.44 |
| ▸ | DRD3 | P35462 | 1/20 | 0.44 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.44 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7537284 | 1.00 | LPL (0.51) | LPLLIPGKCNH2PPARAPPARG | |
| SCHEMBL7539412 | 1.00 | LPL (0.51) | LPLLIPGKCNH2PPARAPPARG | |
| SCHEMBL7539419 | 1.00 | LPL (0.51) | LPLLIPGKCNH2PPARAPPARG | |
| SCHEMBL28305258 | 0.87 | LPL (0.51) | LPLLIPGKCNH2PPARAPPARG | |
| SCHEMBL2750665 | 0.85 | ESR1 (0.50) | LPLLIPG | |
| SCHEMBL7537266 | 0.84 | HTR2A (0.54) | LPLLIPGKCNH2 | |
| SCHEMBL7537271 | 0.84 | HTR2A (0.54) | LPLLIPGKCNH2 | |
| SCHEMBL9836110 | 0.84 | PPARA (0.50) | LPLLIPGPPARAPPARGHDAC4 | |
| SCHEMBL9836116 | 0.84 | PPARA (0.50) | LPLLIPGPPARAPPARGHDAC4 | |
| SCHEMBL27892640 | 0.84 | PPARA (0.53) | LPLLIPGPPARAPPARG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20020015906-A1 | Polymer for photoresist, method of production thereof and photoresist composition containing polymer | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-02-07 | — | — | US | disclosed |