SCHEMBL7537266

SCHEMBL7537266

CCCCCCCc1ccc(/C=C/c2ccccc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 2/20 0.54
ESR1 P03372 2/20 0.53
ADRA2A P08913 2/20 0.53
ADORA3 P0DMS8 2/20 0.53
TACR2 P21452 2/20 0.53
SLC6A2 P23975 2/20 0.53
SLC6A4 P31645 2/20 0.53
SLC6A3 Q01959 2/20 0.53
CYP3A4 P08684 2/20 0.53
ALDH1A1 P00352 2/20 0.53
KDM4E B2RXH2 1/20 0.53
LMNA P02545 1/20 0.53
SHBG P04278 1/20 0.53
TP53 P04637 1/20 0.53
HSPD1 P10809 1/20 0.53
ADRB3 P13945 1/20 0.53
HTR2C P28335 1/20 0.53
HSPE1 P61604 1/20 0.53
HIF1A Q16665 1/20 0.53
TST Q16762 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7537271 1.00 HTR2A (0.54) HTR2AESR1ADRA2AADORA3TACR2
SCHEMBL7539299 0.98 CYSLTR2 (0.53) HTR2AESR1ADRA2AADORA3TACR2
SCHEMBL7539291 0.98 CYSLTR2 (0.53) HTR2AESR1ADRA2AADORA3TACR2
SCHEMBL6546888 0.92 HSD11B1 (0.49) HTR2ACYP3A4ALDH1A1HSD17B10CYSLTR2
SCHEMBL7538660 0.92 HSD11B1 (0.49) HTR2ACYP3A4ALDH1A1HSD17B10CYSLTR2
SCHEMBL30312758 0.92 HSD11B1 (0.49) HTR2ACYP3A4ALDH1A1HSD17B10CYSLTR2
SCHEMBL13108027 0.92 KCNH2 (0.50) HTR2AESR1ADRA2AADORA3TACR2
SCHEMBL2494330 0.91 CYSLTR2 (0.49) HTR2AESR1ADRA2AADORA3TACR2
SCHEMBL14227372 0.91 KCNH2 (0.49) HTR2AESR1ADRA2AADORA3TACR2
SCHEMBL2750665 0.89 ESR1 (0.50) HTR2AESR1ADRA2AADORA3TACR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US disclosed