Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11755065 | 1.00 | CYP2D6 (0.36) | CYP2D6CYP2C19CYP1A2POLB | |
| SCHEMBL11757692 | 1.00 | CYP2D6 (0.36) | CYP2D6CYP2C19CYP1A2POLB | |
| SCHEMBL24703372 | 0.86 | CYP2D6 (0.37) | CYP2D6CYP2C19CYP1A2 | |
| SCHEMBL8613885 | 0.85 | CYP2D6 (0.38) | CYP2D6CYP2C19 | |
| SCHEMBL5837266 | 0.83 | CYP2D6 (0.34) | CYP2D6CYP2C19 | |
| SCHEMBL5837137 | 0.82 | CYP2D6 (0.35) | CYP2D6CYP2C19 | |
| SCHEMBL5836347 | 0.82 | CYP2D6 (0.35) | CYP2D6CYP2C19CYP1A2 | |
| SCHEMBL350877 | 0.82 | CYP2D6 (0.46) | CYP2D6CYP2C19 | |
| SCHEMBL9317520 | 0.81 | CYP2D6 (0.35) | CYP2D6CYP2C19 | |
| SCHEMBL710692 | 0.81 | CYP2D6 (0.35) | CYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 357 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7820355-B2 | Radiation sensitive resin composition | ZEON CORPORATION (JP) | 2010-10-26 | — | — | US | claimed |
| CN-118574898-A | Resin composition and resin film | 日本瑞翁株式会社 | 2024-08-30 | — | — | CN | disclosed |
| CN-111538209-B | Photosensitive resin composition, organic EL element partition wall, and organic EL element | 日保丽公司 | 2024-05-14 | — | — | CN | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| EP-1454952-A1 | OLEFINIC THERMOPLASTIC ELASTOMER, PROCESS FOR PRODUCTION THEREOF, OLEFINIC THERMOPLASTIC ELASTOMER COMPOSITIONS, PROCESS FOR PRODUCING THE SAME AND MOLDINGS THEREOF | JSR Corporation (JP) | 2004-09-08 | — | — | EP | disclosed |
| US-20040152843-A1 | Open-ring copolymer, hydrogenated open-ring copolymer, process for production of both, and compositions | ZEON CORPORATION (JP) | 2004-08-05 | — | — | US | disclosed |
| EP-1408064-A1 | OPEN-RING COPOLYMER, HYDROGENATED OPEN-RING COPOLYMER, PROCESSES FOR PRODUCTION OF BOTH, AND COMPOSITIONS | Zeon Corporation (JP) | 2004-04-14 | — | — | EP | disclosed |
| US-20040029043-A1 | Process for producing circuit substrates | ZEON CORPORATION (JP) | 2004-02-12 | — | — | US | disclosed |
| US-6670426-B2 | Scratch resistance; copolymer of ethylene, an alpha-olefin, and a norbornenecarboxylic acid monomer; crosslinked with a metal ion | JSR CORPORATION (JP) | 2003-12-30 | — | — | US | disclosed |
| US-20030158347-A1 | Olefinic thermoplastic elastomer,process for production thereof, olefinic thermoplastic elastomer compositions,process for producing the same, and moldings thereof | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |
| US-6534586-B2 | Mechanical properties; having nonhalogenated flame retardant | JSR CORPORATION (JP) | 2003-03-18 | — | — | US | disclosed |
| US-20020058746-A1 | Flame-retardant rubber composition and flame-retardant elastomer | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1191061-A1 | Flame-retardant rubber composition and flame-retardant elastomer | JSR Corporation (JP) | 2002-03-27 | — | — | EP | disclosed |
| US-4015007-A | Heterocyclic spiro compounds | CIBA-GEIGY CORPORATION (US) | 1977-03-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240027903-A1 | Resist Material And Patterning Process | LBR, HNRNPU, EWSR1 | CYP2D6 2665/4885CYP2C19 4159/4885CYP1A2 4438/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.