SCHEMBL7538355

SCHEMBL7538355

CCCCCCCCCCOC=Cc1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
EGFR P00533 1/20 0.45
CHRNA7 P36544 3/20 0.43
CHRNA10 Q9GZZ6 3/20 0.43
CHRNA9 Q9UGM1 3/20 0.43
LTA4H P09960 1/20 0.43
TDP1 Q9NUW8 3/20 0.41
BCHE P06276 3/20 0.41
ACHE P22303 2/20 0.41
LMNA P02545 2/20 0.41
TSHR P16473 1/20 0.41
ALDH1A1 P00352 1/20 0.41
RELA Q04206 1/20 0.41
TP53 P04637 1/20 0.40
MAPT P10636 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
HDAC3 O15379 1/20 0.39
CNR1 P21554 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28131524 1.00 EGFR (0.45) EGFRCHRNA7CHRNA10CHRNA9LTA4H
SCHEMBL6313349 1.00 EGFR (0.45) EGFRCHRNA7CHRNA10CHRNA9LTA4H
SCHEMBL2097271 1.00 EGFR (0.45) EGFRCHRNA7CHRNA10CHRNA9LTA4H
SCHEMBL2706079 1.00 EGFR (0.45) EGFRCHRNA7CHRNA10CHRNA9LTA4H
SCHEMBL7540402 1.00 EGFR (0.45) EGFRCHRNA7CHRNA10CHRNA9LTA4H
SCHEMBL6313346 1.00 EGFR (0.45) EGFRCHRNA7CHRNA10CHRNA9LTA4H
SCHEMBL23244048 1.00 EGFR (0.45) EGFRCHRNA7CHRNA10CHRNA9LTA4H
SCHEMBL7541675 1.00 EGFR (0.45) EGFRCHRNA7CHRNA10CHRNA9LTA4H
SCHEMBL21596608 1.00 EGFR (0.45) EGFRCHRNA7CHRNA10CHRNA9LTA4H
SCHEMBL924663 0.98 LTA4H (0.44) EGFRCHRNA7CHRNA10CHRNA9LTA4H

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10593980-B2 Ionomer resin, and ionomer solution, multilayer body, member, electrochemical element, and electrochemical device that include the same NITTO DENKO CORPORATION (JP) 2020-03-17 US disclosed
US-20180053943-A1 IONOMER RESIN, AND IONOMER SOLUTION, MULTILAYER BODY, MEMBER, ELECTROCHEMICAL ELEMENT, AND ELECTROCHEMICAL DEVICE THAT INCLUDE THE SAME NITTO DENKO CORPORATION (JP) 2018-02-22 US disclosed
EP-3269743-A1 IONOMER RESIN AND IONOMER SOLUTION CONTAINING SAME, LAMINATE, MEMBER, ELECTROCHEMICAL ELEMENT, AND ELECTROCHEMICAL DEVICE Nitto Denko Corporation (JP) 2018-01-17 EP disclosed
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US disclosed