SCHEMBL7539565

SCHEMBL7539565

CC12CC3CC(CC(C3)C1(C)OC(=O)C=CC(=O)OC1(C)C3CC4CC(C3)CC1(C)C4)C2

nearest known ligand 0.37

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.37
ALDH1A1 P00352 1/20 0.37
LMNA P02545 1/20 0.37
HTT P42858 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
CYP2C9 P11712 1/20 0.34
SCN1A P35498 1/20 0.33
SCN2A Q99250 1/20 0.33
SCN3A Q9NY46 1/20 0.33
NPSR1 Q6W5P4 1/20 0.32
GLA P06280 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7543054 0.90 HCAR2 (0.40) THRBALDH1A1LMNAHTTSMN1; SMN2
SCHEMBL35447 0.87 SCN1A (0.32) SCN1ASCN2ASCN3A
SCHEMBL17746548 0.79 MAPT (0.33) SCN1ASCN2ASCN3AGLA
SCHEMBL3182594 0.77 GLA (0.33) ALDH1A1SCN1ASCN2ASCN3AGLA
SCHEMBL7539568 0.76 THRB (0.37) THRBALDH1A1LMNAHTTSMN1; SMN2
SCHEMBL7539563 0.76 THRB (0.37) THRBALDH1A1LMNAHTTSMN1; SMN2
SCHEMBL7745860 0.74 CYP17A1 (0.41) THRBALDH1A1LMNAHTTSMN1; SMN2
SCHEMBL5004827 0.72 SCN1A (0.31) SCN1ASCN2ASCN3A
SCHEMBL2307504 0.71 THRB (0.44) THRBALDH1A1LMNAHTTSMN1; SMN2
SCHEMBL7536676 0.71 THRB (0.44) THRBALDH1A1LMNAHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020190818-A1 High frequency band pass filter TDK CORPORATION (JP) 2002-12-19 US disclosed
EP-0788118-B1 Low dielectric polymer and film, substrate and electronic part using the same TDK CORP (JP) 2002-11-20 EP disclosed
US-5914283-A FUMARIC ACID DIESTER MONOMER-CONTAINING POLYMER FILM; HEAT RESISTANCE, WEATHER RESISTANCE TDK CORPORATION (JP) 1999-06-22 US disclosed
EP-0788118-A1 Low dielectric polymer and film, substrate and electronic part using the same TDK Corporation (JP) 1997-08-06 EP disclosed