SCHEMBL7541382

SCHEMBL7541382

Cc1ccc(S(=O)(=O)C2(S(=O)(=O)c3ccc(C)cc3)CCC2)cc1

nearest known ligand 0.92

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.92
KMT2A Q03164 1/20 0.92
GAA P10253 3/20 0.59
MCOLN3 Q8TDD5 1/20 0.59
EEF2K O00418 1/20 0.53
ALDH1A1 P00352 5/20 0.49
HPGD P15428 2/20 0.49
NPSR1 Q6W5P4 1/20 0.49
POLB P06746 3/20 0.46
TP53 P04637 1/20 0.46
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA3 P07451 1/20 0.45
CA6 P23280 1/20 0.45
CA5A P35218 1/20 0.45
CA7 P43166 1/20 0.45
CA9 Q16790 1/20 0.45
CA5B Q9Y2D0 1/20 0.45
PKM P14618 4/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7541872 0.96 SMN1; SMN2 (1.00) SMN1; SMN2KMT2AGAAMCOLN3EEF2K
SCHEMBL7545717 0.94 KMT2A (0.96) SMN1; SMN2KMT2AGAAMCOLN3EEF2K
SCHEMBL7543813 0.94 KMT2A (0.96) SMN1; SMN2KMT2AGAAMCOLN3EEF2K
SCHEMBL14544487 0.82 SMN1; SMN2 (0.63) SMN1; SMN2KMT2AGAAALDH1A1HPGD
SCHEMBL6099547 0.78 GAA (0.91) SMN1; SMN2KMT2AGAAMCOLN3EEF2K
SCHEMBL9412364 0.78 KMT2A (0.68) SMN1; SMN2KMT2AGAAMCOLN3EEF2K
SCHEMBL19558567 0.77 SMN1; SMN2 (0.62) SMN1; SMN2KMT2AGAAALDH1A1HPGD
SCHEMBL6386533 0.76 KMT2A (0.67) SMN1; SMN2KMT2AGAAMCOLN3ALDH1A1
SCHEMBL28330359 0.76 SMN1; SMN2 (0.56) SMN1; SMN2KMT2AGAAALDH1A1HPGD
SCHEMBL17808345 0.76 KMT2A (0.56) SMN1; SMN2KMT2AGAAALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed