SCHEMBL7543813

SCHEMBL7543813

Cc1ccc(S(=O)(=O)C2(S(=O)(=O)c3ccc(C)cc3)CCCCC2)cc1

nearest known ligand 0.96

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.96
SMN1; SMN2 Q16637 2/20 0.96
GAA P10253 2/20 0.62
MCOLN3 Q8TDD5 1/20 0.62
EEF2K O00418 1/20 0.52
ALDH1A1 P00352 5/20 0.51
HPGD P15428 1/20 0.51
NPSR1 Q6W5P4 1/20 0.51
POLB P06746 3/20 0.45
TP53 P04637 1/20 0.45
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA3 P07451 1/20 0.43
CA6 P23280 1/20 0.43
CA5A P35218 1/20 0.43
CA7 P43166 1/20 0.43
CA9 Q16790 1/20 0.43
CA5B Q9Y2D0 1/20 0.43
CYP3A4 P08684 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7545717 1.00 KMT2A (0.96) KMT2ASMN1; SMN2GAAMCOLN3EEF2K
SCHEMBL7541872 0.98 SMN1; SMN2 (1.00) KMT2ASMN1; SMN2GAAMCOLN3EEF2K
SCHEMBL7541382 0.94 SMN1; SMN2 (0.92) KMT2ASMN1; SMN2GAAMCOLN3EEF2K
SCHEMBL9412364 0.84 KMT2A (0.68) KMT2ASMN1; SMN2GAAMCOLN3EEF2K
SCHEMBL11785253 0.81 KMT2A (0.65) KMT2ASMN1; SMN2GAAALDH1A1HPGD
SCHEMBL3193960 0.79 GAA (0.96) KMT2ASMN1; SMN2GAAMCOLN3EEF2K
SCHEMBL7541549 0.79 GAA (0.96) KMT2ASMN1; SMN2GAAMCOLN3EEF2K
SCHEMBL6386533 0.78 KMT2A (0.67) KMT2ASMN1; SMN2GAAMCOLN3ALDH1A1
SCHEMBL3193854 0.77 GAA (1.00) KMT2ASMN1; SMN2GAAMCOLN3EEF2K
SCHEMBL14544487 0.76 SMN1; SMN2 (0.63) KMT2ASMN1; SMN2GAAALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed