SCHEMBL6099547

SCHEMBL6099547

O=S(=O)(c1ccccc1)C1(S(=O)(=O)c2ccccc2)CCC1

nearest known ligand 0.91

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.91
MCOLN3 Q8TDD5 1/20 0.91
SMN1; SMN2 Q16637 2/20 0.59
KMT2A Q03164 1/20 0.59
EEF2K O00418 1/20 0.52
HTR7 P34969 7/20 0.45
HTR6 P50406 1/20 0.44
PSEN1 P49768 2/20 0.43
PSEN2 P49810 2/20 0.43
APH1B Q8WW43 2/20 0.43
NCSTN Q92542 2/20 0.43
APH1A Q96BI3 2/20 0.43
PSENEN Q9NZ42 2/20 0.43
ALDH1A1 P00352 1/20 0.41
HSD17B10 Q99714 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA3 P07451 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3193854 0.95 GAA (1.00) GAAMCOLN3SMN1; SMN2KMT2AEEF2K
SCHEMBL3193960 0.93 GAA (0.96) GAAMCOLN3SMN1; SMN2KMT2AEEF2K
SCHEMBL7541549 0.93 GAA (0.96) GAAMCOLN3SMN1; SMN2KMT2AEEF2K
SCHEMBL16865174 0.91 GAA (0.83) GAAMCOLN3SMN1; SMN2KMT2AEEF2K
SCHEMBL8393942 0.78 GAA (0.59) GAAMCOLN3SMN1; SMN2HTR7HTR6
SCHEMBL7541382 0.78 SMN1; SMN2 (0.92) GAAMCOLN3SMN1; SMN2KMT2AEEF2K
SCHEMBL7541463 0.77 GAA (0.63) GAAMCOLN3SMN1; SMN2KMT2AEEF2K
SCHEMBL8393598 0.74 GAA (0.64) GAAMCOLN3SMN1; SMN2KMT2AHTR7
SCHEMBL7541872 0.74 SMN1; SMN2 (1.00) GAAMCOLN3SMN1; SMN2KMT2AEEF2K
SCHEMBL8391526 0.74 HTR7 (0.54) GAAMCOLN3HTR7HTR6PSEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
US-11970557-B2 Polymer containing photoacid generator LG CHEM, LTD. (KR) 2024-04-30 US disclosed
US-11681227-B2 Enhanced EUV photoresist materials, formulations and processes IRRESISTIBLE MATERIALS LTD (GB) 2023-06-20 US disclosed
US-20210102021-A1 POLYMER CONTAINING PHOTOACID GENERATOR LG CHEM, LTD. (KR) 2021-04-08 US disclosed
US-20200272050-A1 Enhanced EUV Photoresist Materials, Formulations and Processes IRRESISTIBLE MATERIALS, LTD (GB) 2020-08-27 US disclosed
US-10095112-B2 Multiple trigger photoresist compositions and methods IRRESISTIBLE MATERIALS LTD (GB) 2018-10-09 US disclosed
US-20180246408-A1 MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS IRRESISTIBLE MATERIALS, LTD (GB) 2018-08-30 US disclosed
US-9519215-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS, LTD (GB) 2016-12-13 US disclosed
US-20160246173-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-08-25 US disclosed
WO-2014078097-A1 METHANOFULLERENES ROBINSON ALEX PHILIP GRAHAM (GB) 2014-05-22 WO disclosed
US-20140134843-A1 Methanofullerenes IRRESISTIBLE MATERIALS LTD (GB) 2014-05-15 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-7101892-B2 Sulfone derivatives as 5-HT7 receptor ligands MERCK SHARP & DOHME LTD. 2006-09-05 US disclosed
US-20040229864-A1 Sulfone derivatives as 5-HT7 receptor ligands MERCK SHARP & DOHME LTD. (GB) 2004-11-18 US disclosed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040229864-A1 Sulfone derivatives as 5-HT7 receptor ligands HTR7, HTR2C, HTR1A GAA 4655/4885MCOLN3 2536/4885SMN1; SMN2 1794/4885
US-10095112-B2 Multiple trigger photoresist compositions and methods ERCC4, ERCC2, APEX1 GAA 1241/4885MCOLN3 3419/4885SMN1; SMN2 4771/4885
US-20140134843-A1 Methanofullerenes WASF2, ERCC4, TUFM GAA 4372/4885MCOLN3 233/4885SMN1; SMN2 4358/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.