SCHEMBL7541549

SCHEMBL7541549

O=S(=O)(c1ccccc1)C1(S(=O)(=O)c2ccccc2)CCCCCC1

nearest known ligand 0.96

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.96
MCOLN3 Q8TDD5 1/20 0.96
SMN1; SMN2 Q16637 2/20 0.62
KMT2A Q03164 1/20 0.62
PSEN1 P49768 3/20 0.50
PSEN2 P49810 3/20 0.50
APH1B Q8WW43 3/20 0.50
NCSTN Q92542 3/20 0.50
APH1A Q96BI3 3/20 0.50
PSENEN Q9NZ42 3/20 0.50
EEF2K O00418 1/20 0.50
HTR7 P34969 1/20 0.44
RORC P51449 1/20 0.43
HTR6 P50406 1/20 0.42
ALDH1A1 P00352 2/20 0.39
HSD17B10 Q99714 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3193960 1.00 GAA (0.96) GAAMCOLN3SMN1; SMN2KMT2APSEN1
SCHEMBL3193854 0.98 GAA (1.00) GAAMCOLN3SMN1; SMN2KMT2APSEN1
SCHEMBL6099547 0.93 GAA (0.91) GAAMCOLN3SMN1; SMN2KMT2APSEN1
SCHEMBL16865174 0.89 GAA (0.83) GAAMCOLN3SMN1; SMN2KMT2APSEN1
SCHEMBL8393842 0.79 GAA (0.62) GAAMCOLN3SMN1; SMN2KMT2APSEN1
SCHEMBL8396704 0.79 GAA (0.62) GAAMCOLN3SMN1; SMN2KMT2APSEN1
SCHEMBL7545717 0.79 KMT2A (0.96) GAAMCOLN3SMN1; SMN2KMT2AEEF2K
SCHEMBL7543813 0.79 KMT2A (0.96) GAAMCOLN3SMN1; SMN2KMT2AEEF2K
SCHEMBL19129009 0.78 PSEN1 (0.78) GAAMCOLN3PSEN1PSEN2APH1B
SCHEMBL8393598 0.77 GAA (0.64) GAAMCOLN3SMN1; SMN2KMT2APSEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP claimed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US claimed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP claimed
EP-0819981-B1 Radiation sensitive resin composition JSR CORP (JP) 2002-06-05 EP disclosed
US-5952150-A COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS JSR CORPORATION (JP) 1999-09-14 US disclosed
EP-0819981-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-01-21 EP disclosed