SCHEMBL7541883

SCHEMBL7541883

COCCCCCOC=Cc1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
TRPA1 O75762 2/20 0.41
NFE2L2 Q16236 1/20 0.41
CHRNA7 P36544 9/20 0.40
CHRNA10 Q9GZZ6 3/20 0.40
CHRNA9 Q9UGM1 3/20 0.40
NPC1 O15118 2/20 0.38
GAA P10253 2/20 0.38
RAB9A P51151 2/20 0.38
KDM4E B2RXH2 1/20 0.38
ALDH1A1 P00352 1/20 0.38
GLA P06280 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
ATM Q13315 1/20 0.38
RXFP1 Q9HBX9 1/20 0.38
PPARA Q07869 1/20 0.37
RELA Q04206 1/20 0.37
TUBB4A P04350 1/20 0.36
TUBB P07437 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8093709 0.87 MEN1 (0.50) MEN1KMT2ATRPA1NFE2L2CHRNA7
SCHEMBL6313349 0.86 EGFR (0.45) CHRNA7CHRNA10CHRNA9ALDH1A1SMN1; SMN2
SCHEMBL7541675 0.86 EGFR (0.45) CHRNA7CHRNA10CHRNA9ALDH1A1SMN1; SMN2
SCHEMBL2097271 0.86 EGFR (0.45) CHRNA7CHRNA10CHRNA9ALDH1A1SMN1; SMN2
SCHEMBL7540402 0.86 EGFR (0.45) CHRNA7CHRNA10CHRNA9ALDH1A1SMN1; SMN2
SCHEMBL23244048 0.86 EGFR (0.45) CHRNA7CHRNA10CHRNA9ALDH1A1SMN1; SMN2
SCHEMBL6313346 0.86 EGFR (0.45) CHRNA7CHRNA10CHRNA9ALDH1A1SMN1; SMN2
SCHEMBL7538355 0.86 EGFR (0.45) CHRNA7CHRNA10CHRNA9ALDH1A1SMN1; SMN2
SCHEMBL21596608 0.86 EGFR (0.45) CHRNA7CHRNA10CHRNA9ALDH1A1SMN1; SMN2
SCHEMBL2706079 0.86 EGFR (0.45) CHRNA7CHRNA10CHRNA9ALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US disclosed