Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 1/20 | 0.62 |
| ▸ | MAPT | P10636 | 4/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | XBP1 | P17861 | 1/20 | 0.47 |
| ▸ | ELANE | P08246 | 2/20 | 0.47 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4237838 | 0.77 | CYP2C19 (1.00) | CYP2C19MAPTKMT2AMAPK1NPSR1 | |
| SCHEMBL8925834 | 0.77 | CYP2C19 (1.00) | CYP2C19MAPTKMT2AMAPK1NPSR1 | |
| SCHEMBL28551481 | 0.77 | CYP2C19 (1.00) | CYP2C19MAPTKMT2AMAPK1NPSR1 | |
| SCHEMBL16710294 | 0.77 | CYP2C19 (1.00) | CYP2C19MAPTKMT2AMAPK1NPSR1 | |
| Styrene SCHEMBL6757449 | 0.75 | CYP2C19 (0.71) | CYP2C19MAPTKMT2AMAPK1NPSR1 | |
| SCHEMBL8445831 | 0.74 | CYP2C19 (0.66) | CYP2C19MAPTKMT2AMAPK1NPSR1 | |
| SCHEMBL5565430 | 0.74 | CYP2C19 (0.64) | CYP2C19MAPTKMT2AMAPK1NPSR1 | |
| SCHEMBL29022975 | 0.74 | MAPT (0.78) | CYP2C19MAPTKMT2AMAPK1NPSR1 | |
| SCHEMBL309536 | 0.74 | MAPT (0.78) | CYP2C19MAPTKMT2AMAPK1NPSR1 | |
| Styrene SCHEMBL5394272 | 0.73 | CYP2C19 (0.62) | CYP2C19MAPTKMT2AMAPK1NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20020015906-A1 | Polymer for photoresist, method of production thereof and photoresist composition containing polymer | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-02-07 | — | — | US | disclosed |