⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL132687 | 0.80 | — | — | |
| SCHEMBL9959845 | 0.75 | — | — | |
| SCHEMBL9959847 | 0.75 | — | — | |
| SCHEMBL9954326 | 0.71 | — | — | |
| SCHEMBL9954330 | 0.71 | — | — | |
| SCHEMBL274876 | 0.71 | — | — | |
| SCHEMBL7697373 | 0.69 | — | — | |
| Cyclohexene SCHEMBL3005 | 0.62 | — | — | |
| SCHEMBL117657 | 0.62 | ALDH1A1 (0.32) | — | |
| Cyclopentene SCHEMBL9112 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0819981-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2002-06-05 | — | — | EP | disclosed |
| US-5952150-A | COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS | JSR CORPORATION (JP) | 1999-09-14 | — | — | US | disclosed |
| EP-0819981-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-01-21 | — | — | EP | disclosed |