⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL172006 | 0.85 | — | — | |
| SCHEMBL14549206 | 0.80 | — | — | |
| SCHEMBL9975638 | 0.80 | — | — | |
| SCHEMBL415325 | 0.80 | — | — | |
| SCHEMBL22399918 | 0.80 | — | — | |
| SCHEMBL10064058 | 0.79 | — | — | |
| SCHEMBL12254936 | 0.78 | F2R (0.30) | — | |
| SCHEMBL712774 | 0.76 | — | — | |
| SCHEMBL14564558 | 0.75 | PRSS1 (0.33) | — | |
| SCHEMBL13266294 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 480 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230174471-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | INHA INDUSTRY PARTNERSHIP INSTITUTE (KR) | 2023-06-08 | — | — | US | disclosed |
| US-20230174471-A1 | ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME | INHA INDUSTRY PARTNERSHIP INSTITUTE (KR) | 2023-06-08 | — | — | US | disclosed |
| EP-3486067-B1 | METHOD FOR PRODUCING ANTIFOULING FILM | SHARP KK (JP) | 2022-09-28 | — | — | EP | disclosed |
| US-11142653-B2 | Method for producing antifouling film | SHARP KABUSHIKI KAISHA (JP) | 2021-10-12 | — | — | US | disclosed |
| US-11142617-B2 | Method for producing antifouling film | SHARP KABUSHIKI KAISHA (JP) | 2021-10-12 | — | — | US | disclosed |
| EP-3485986-B1 | METHOD FOR PRODUCING ANTIFOULING FILM | SHARP KK (JP) | 2020-05-20 | — | — | EP | disclosed |
| US-10457761-B2 | Polymer, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-29 | — | — | US | disclosed |
| US-20190300666-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | SHARP KABUSHIKI KAISHA (JP) | 2019-10-03 | — | — | US | disclosed |
| US-20190233656-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | DAIKIN INDUSTRIES, LTD. (JP) | 2019-08-01 | — | — | US | disclosed |
| EP-3486067-A1 | METHOD FOR PRODUCING ANTIFOULING FILM | Sharp Kabushiki Kaisha (JP) | 2019-05-22 | — | — | EP | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-20060205957-A1 | Process for producing vinyl ether compounds | ISHII YASUTAKA | 2006-09-14 | — | — | US | disclosed |
| US-20060160247-A1 | Unsaturated carboxylic acid hemicacetal ester, polymeric compound and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-07-20 | — | — | US | disclosed |
| US-7074970-B2 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-07-11 | — | — | US | disclosed |
| US-20060058480-A1 | Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| US-20030083529-A1 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-05-01 | — | — | US | disclosed |
| EP-1288186-A2 | Vinyl ether compounds and preparation process thereof | Daicel Chemical Industries, Ltd. (JP) | 2003-03-05 | — | — | EP | disclosed |