SCHEMBL7549549

SCHEMBL7549549

O=C(CC(=O)c1ccc(O)cc1O)c1ccc(O)cc1O

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSP90AB1 P08238 1/20 0.70
ESR1 P03372 1/20 0.66
SHBG P04278 1/20 0.66
ESR2 Q92731 1/20 0.66
ALDH1A1 P00352 4/20 0.64
GFER P55789 1/20 0.64
CES2 O00748 1/20 0.64
CA12 O43570 3/20 0.61
CA1 P00915 3/20 0.61
CA2 P00918 3/20 0.61
CA7 P43166 3/20 0.61
CA9 Q16790 3/20 0.61
CA14 Q9ULX7 3/20 0.61
TSHR P16473 1/20 0.61
HTT P42858 2/20 0.59
PDK2 Q15119 1/20 0.59
PDK4 Q16654 1/20 0.59
RAB9A P51151 4/20 0.58
NPC1 O15118 3/20 0.58
LMNA P02545 2/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1259813 0.90 NPC1 (0.65) HSP90AB1ESR1SHBGESR2ALDH1A1
SCHEMBL12189745 0.89 HSP90AB1 (0.62) HSP90AB1ESR1SHBGESR2ALDH1A1
SCHEMBL14838036 0.87 MEN1 (0.64) HSP90AB1ESR1SHBGESR2ALDH1A1
SCHEMBL105417 0.86 HSP90AB1 (0.70) HSP90AB1ESR1SHBGESR2ALDH1A1
SCHEMBL6427459 0.86 HSP90AB1 (0.70) HSP90AB1ESR1SHBGESR2ALDH1A1
Water SCHEMBL1231468 0.84 HSP90AB1 (0.68) HSP90AB1ESR1SHBGESR2ALDH1A1
SCHEMBL31105825 0.83 HSP90AB1 (0.66) HSP90AB1ESR1SHBGESR2ALDH1A1
SCHEMBL10350385 0.83 HTT (0.83) HSP90AB1ESR1SHBGESR2ALDH1A1
SCHEMBL3844607 0.83 HSP90AB1 (0.66) HSP90AB1ESR1SHBGESR2ALDH1A1
SCHEMBL4828627 0.83 HSP90AB1 (0.66) HSP90AB1ESR1SHBGESR2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0742490-B1 Positive acid catalized resists SHIPLEY CO LLC (US) 2002-06-12 EP disclosed
US-5917024-A Acid labile photoactive composition SHIPLEY COMPANY, L.L.C. (US) 1999-06-29 US disclosed
US-5858605-A PHOTORESIST COATING COMPRISING ALKALI SOLUBLE RESIN AND PHOTOACTIVE COMPOUND, REACTION PRODUCT OF VINYL ETHER AND ORTHO-NAPHTHOQUINONEDIAZIDE SULFONYL COMPOUND, DISSOLVED IN SOLVENT SHIPLEY COMPANY, L.L.C. (US) 1999-01-12 US disclosed
US-5827634-A FOR DEEP ULTRAVIOLET EXPOSURE; RESOLUTION SHIPLEY COMPANY, L.L.C. (US) 1998-10-27 US disclosed
US-5763536-A PHOTORESIST BINDER CONSISTING OF NOVOLAK RESIN OR POLYVINYLPHENOL RESIN SHIPLEY COMPANY, L.L.C. (US) 1998-06-09 US disclosed
US-5731386-A Polymer for positive acid catalyzed resists SHIPLEY COMPANY, L.L.C. (US) 1998-03-24 US disclosed
US-5719003-A Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers SHIPLEY COMPANY, L.L.C. (US) 1998-02-17 US disclosed
US-5700624-A Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups SHIPLEY COMPANY, L.L.C. (US) 1997-12-23 US disclosed
US-5648194-A HIGH SPEED SHIPLEY COMPANY, L.L.C. (US) 1997-07-15 US disclosed
US-5641604-A Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers SHIPLEY COMPANY, L.L.C. (US) 1997-06-24 US disclosed
EP-0742490-A1 Positive acid catalized resists Shipley Company LLC (US) 1996-11-13 EP disclosed