SCHEMBL755359

SCHEMBL755359

CS(=O)(=O)[O-].CS(=O)(=O)[O-].[SnH2+2]

nearest known ligand 0.50

Known targets — ChEMBL curated mechanism

ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.50
CYP3A4 P08684 1/20 0.50
CA1 P00915 1/20 0.42
TSHR P16473 2/20 0.39
MEN1 O00255 1/20 0.39
ALDH1A1 P00352 1/20 0.39
KMT2A Q03164 1/20 0.39
USP2 O75604 1/20 0.36
CA2 P00918 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4858286 0.89 KDM4E (0.50) KDM4ECYP3A4CA1TSHRMEN1
SCHEMBL676774 0.89 KDM4E (0.50) KDM4ECYP3A4CA1TSHRMEN1
SCHEMBL17065543 0.89 KDM4E (0.50) KDM4ECYP3A4CA1TSHRMEN1
SCHEMBL23567016 0.89 KDM4E (0.50) KDM4ECYP3A4CA1TSHRMEN1
SCHEMBL20570963 0.89 KDM4E (0.50) KDM4ECYP3A4CA1TSHRMEN1
SCHEMBL23926540 0.89 KDM4E (0.50) KDM4ECYP3A4CA1TSHRMEN1
SCHEMBL22749162 0.89 KDM4E (0.50) KDM4ECYP3A4CA1TSHRMEN1
SCHEMBL20570026 0.89 KDM4E (0.50) KDM4ECYP3A4CA1TSHRMEN1
SCHEMBL20570539 0.89
SCHEMBL22581617 0.89 KDM4E (0.50) KDM4ECYP3A4CA1TSHRMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 898 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117816641-B Washing device for stannous methanesulfonate crystal preparation and use method 广西华锡有色金属股份有限公司 2026-05-12 CN claimed
CN-122013269-A Electroplating method of low-pore nanoscale bright tin layer 惠州祥奇科技有限公司 2026-05-12 CN claimed
CN-119930478-A Method for rapidly preparing stannous methanesulfonate 柳州华锡有色设计研究院有限责任公司 2025-05-06 CN claimed
CN-116237038-B Catalyst for preparing p-bromoxynil by ammoxidation method, preparation method and application 中南民族大学 2025-04-18 CN claimed
CN-119772447-A Preparation method and application of polymer copper powder mixed core solder ball 上海锡喜材料科技有限公司 2025-04-08 CN claimed
CN-119753770-A Cyanide-free tinning electroplating solution and preparation method thereof 龙腾半导体股份有限公司 2025-04-04 CN claimed
CN-115948775-B Methanesulfonic acid high-speed tinning liquid for high-speed tinning and preparation method thereof 广州三孚新材料科技股份有限公司 2025-04-01 CN claimed
CN-118531447-B Dense and smooth metal tin based on methylsulfonic acid system and preparation method thereof 中南大学 2025-03-25 CN claimed
CN-119617800-A Stannous methanesulfonate microwave vacuum drying method 柳州华锡有色设计研究院有限责任公司 2025-03-14 CN claimed
CN-118854386-B Environment-friendly acidic tinning electrolyte and environment-friendly tinning process implemented by using same 中山市康迪斯威科技有限公司 2025-03-11 CN claimed
CN-101476150-A Device and method for electroplating Sn-Cu alloy GUANGZHOU ELECTRIC APPARATUS R (CN) 2009-07-08 CN claimed
US-20090081370-A1 METHOD FOR COATING SUBSTRATES CONTAINING ANTIMONY COMPOUNDS WITH TIN AND TIN ALLOYS ATOTECH DEUTSCHLAND GMBH (DE) 2009-03-26 US claimed
CN-101235000-A Production of stannous methylsulfonate for micro-electronics in tower-type reaction device by using tin flower as raw material TIANJIN CONWALT SCIENCE AND TE (CN) 2008-08-06 CN claimed
US-7309411-B2 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys CITIBANK, N.A. 2007-12-18 US claimed
CN-1657520-A Process for preparing methyl stannous sulfonate using tin powder RES DESIGN INST YUNNAN TIN IND (CN) 2005-08-24 CN claimed
EP-1430166-A2 ELECTROLYTE MEDIA FOR THE DEPOSITION OF TIN ALLOYS AND METHODS FOR DEPOSITING TIN ALLOYS MacDermid Plc (GB) 2004-06-23 EP claimed
US-20040065558-A1 Electrolyte media for the deposition of tin alloys and methods for depositing tin alloys CITIBANK, N.A. 2004-04-08 US claimed
WO-2002072923-A2 ELECTROLYTE MEDIA FOR THE DEPOSITION OF TIN ALLOYS AND METHODS FOR DEPOSITING TIN ALLOYS MACDERMID PLC (GB) 2002-09-19 WO claimed
US-6176996-B1 TIN ALLOY ELECTROPLATING BATH CONTAINING A TIN SALT, BISMUTH, METHANESULFONIC ACID, A CONDUCTIVE COMPOUND AND A LIGAND N,N,N',N'-TETRAKIS(2-HYDROXYPROPYL)ETHYLENEDIAMINE OR N,N,N'N'-TETRAKIS(2-PYRIDYLMETHYLPROPYL)ETHYLENEDIAMINE MOON SUNGSOO (KR) 2001-01-23 US claimed
US-4244739-A ALIPHATIC SULFONIC ACID NOBLE METAL SALTS, FREE OF HYDROCHLORIC ACID METALLIZATION OF NONCONDUCTOR SUPPORTS CAGNASSI ROBERTO 1981-01-13 US claimed