SCHEMBL7561555

SCHEMBL7561555

C=CCCCC(N)CCC(O)OC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36985 0.85 ALDH1A1 (0.34)
SCHEMBL8222324 0.79 USP2 (0.40)
SCHEMBL1242583 0.78 TSHR (0.41)
SCHEMBL8211764 0.77 USP2 (0.42)
SCHEMBL8887818 0.77 USP2 (0.42)
SCHEMBL1240084 0.71 TSHR (0.42)
SCHEMBL4228975 0.69 TSHR (0.46)
SCHEMBL28719109 0.69 TSHR (0.56)
SCHEMBL617879 0.69 TSHR (0.50)
SCHEMBL8731905 0.68 ALDH1A1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020037472-A1 Novel polymers and photoresist compositions comprising labile polymer backbones for short wave imaging SHIPLEY COMPANY, L.L.C. 2002-03-28 US disclosed
WO-2002021214-A2 USE OF ACETAL/KETAL POLYMERS IN PHOTORESIST COMPOSITIONS SUITABLE FOR SHORT WAVE IMAGING SHIPLEY COMPANY, L.L.C. (US) 2002-03-14 WO disclosed
US-5917024-A Acid labile photoactive composition SHIPLEY COMPANY, L.L.C. (US) 1999-06-29 US disclosed
US-5858605-A PHOTORESIST COATING COMPRISING ALKALI SOLUBLE RESIN AND PHOTOACTIVE COMPOUND, REACTION PRODUCT OF VINYL ETHER AND ORTHO-NAPHTHOQUINONEDIAZIDE SULFONYL COMPOUND, DISSOLVED IN SOLVENT SHIPLEY COMPANY, L.L.C. (US) 1999-01-12 US disclosed