SCHEMBL7568029

SCHEMBL7568029

Cn1c(S(=O)(=O)C(Br)(Br)Br)nc2ccccc21

nearest known ligand 0.52

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.49
HTT P42858 2/20 0.49
MAPT P10636 2/20 0.49
RAB9A P51151 1/20 0.49
SMN1; SMN2 Q16637 3/20 0.49
ATM Q13315 1/20 0.46
USP2 O75604 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
POLB P06746 1/20 0.45
TSHR P16473 1/20 0.44
KDM4E B2RXH2 4/20 0.44
GAA P10253 1/20 0.44
HPGD P15428 1/20 0.44
CYP1A2 P05177 1/20 0.43
CYP2C19 P33261 1/20 0.43
HSD11B1 P28845 2/20 0.43
THRB P10828 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9695987 0.81 CYP1A2 (0.58) ALDH1A1HTTMAPTRAB9ASMN1; SMN2
SCHEMBL1275146 0.79 POLB (0.64) ALDH1A1HTTMAPTRAB9ASMN1; SMN2
SCHEMBL14194278 0.78 MAPK1 (0.50) ALDH1A1HTTMAPTUSP2POLB
SCHEMBL11973670 0.77 ALDH1A1 (0.72) ALDH1A1HTTMAPTSMN1; SMN2POLB
SCHEMBL15916811 0.75 ALOX5AP (0.48) ALDH1A1HTTMAPTRAB9ASMN1; SMN2
SCHEMBL10465990 0.72 SMN1; SMN2 (0.55) ALDH1A1HTTMAPTRAB9ASMN1; SMN2
SCHEMBL6894899 0.71 POLB (0.57) ALDH1A1HTTSMN1; SMN2ATMUSP2
SCHEMBL10969560 0.69 SMN1; SMN2 (0.57) ALDH1A1HTTMAPTRAB9ASMN1; SMN2
SCHEMBL2105815 0.69 SMN1; SMN2 (0.61) ALDH1A1HTTMAPTRAB9ASMN1; SMN2
SCHEMBL6990517 0.68 SMN1; SMN2 (0.55) ALDH1A1HTTMAPTRAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0720053-B1 Photosensitive resin composition, photosensitive printing plate and method of manufacturing printing master plate TOKYO OHKA KOGYO CO LTD (JP) 2002-09-04 EP claimed
US-5885746-A COMPRISING A POLYMER BINDER, A MONOMER, A PHOTOINITIATOR ACTIVATED BY VISIBLE LASER LIGHT, A PHOTOSENSITIVE ACID-GENERATING AGENT AND A CHROMOGEN; OFFSET PRINTING; STORAGE STABILITY; RESOLUTION; MATERIALS HANDLING; EFFICIENCY TOKYO OHKA KOGYO CO., LTD. (JP) 1999-03-23 US claimed
EP-0720053-A2 Photosensitive resin composition, photosensitive printing plate and method of manufacturing printing master plate TOKYO OHKA KOGYO CO., LTD. (JP) 1996-07-03 EP claimed
EP-0720053-B1 Photosensitive resin composition, photosensitive printing plate and method of manufacturing printing master plate TOKYO OHKA KOGYO CO LTD (JP) 2002-09-04 EP disclosed
US-4465761-A HALO COMPOUND, LEUCO DYE, AROMATIC AMINE SENSITIZER, BINDER AND ALIPHATIC AMINE; ANTIFOGGING AGENTS ORIENTAL PHOTO INDUSTRIES CO., LTD. (JP) 1984-08-14 US disclosed
EP-0026859-B1 IMAGE-FORMING PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE COATING SOLUTION AND PHOTOSENSITIVE SHEET COMPRISING THIS COMPOSITION ORIENTAL PHOTO INDUSTRIES, CO., LTD. (JP) 1983-10-05 EP disclosed
US-3957513-A Method of free radical photography utilizing a short light flash for exposure ASAHI KASEI KOGYO KABUSHIKI KAISHA (JA) 1976-05-18 US disclosed