Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.57 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.57 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.45 |
| ▸ | LOXL2 | Q9Y4K0 | 2/20 | 0.45 |
| ▸ | TP53 | P04637 | 2/20 | 0.45 |
| ▸ | IDO1 | P14902 | 2/20 | 0.45 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.45 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.43 |
| ▸ | MAOB | P27338 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.43 |
| ▸ | CASP1 | P29466 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.41 |
| ▸ | HTR2A | P28223 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL995842 | 0.97 | ALDH1A1 (0.55) | ALDH1A1TDP1KDM4ECALM1TSHR | |
| Fluoride Ion SCHEMBL7789157 | 0.97 | ALDH1A1 (0.55) | ALDH1A1TDP1KDM4ECALM1TSHR | |
| Hydrochloric Acid SCHEMBL1937107 | 0.97 | ALDH1A1 (0.62) | ALDH1A1TDP1KDM4ECALM1TSHR | |
| Water SCHEMBL973500 | 0.97 | ALDH1A1 (0.55) | ALDH1A1TDP1KDM4ECALM1TSHR | |
| Iodide SCHEMBL5085346 | 0.97 | ALDH1A1 (0.55) | ALDH1A1TDP1KDM4ECALM1TSHR | |
| SCHEMBL6043431 | 0.89 | ALDH1A1 (0.48) | ALDH1A1TDP1KDM4ECALM1TSHR | |
| SCHEMBL7640984 | 0.89 | ALDH1A1 (0.48) | ALDH1A1TDP1KDM4ECALM1TSHR | |
| SCHEMBL7641909 | 0.89 | ALDH1A1 (0.48) | ALDH1A1TDP1KDM4ECALM1TSHR | |
| SCHEMBL7642773 | 0.87 | ALDH1A1 (0.46) | ALDH1A1TDP1KDM4ECALM1TSHR | |
| Sulfuric Acid SCHEMBL7640994 | 0.84 | KDM4E (0.44) | ALDH1A1TDP1KDM4EKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 487 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4048751-B1 | POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE | CMC MAT LLC (US) | 2025-03-19 | — | — | EP | claimed |
| CN-119504843-A | Quinoxaline-5-carboxylic acid coordinated catalyst, composite catalyst, preparation method and application | 上海元革新材料科技有限公司 | 2025-02-25 | — | — | CN | claimed |
| EP-3362494-B1 | POLYURETHANE CATALYSTS FROM SULFUR BASED SALTS | EVONIK OPERATIONS GMBH (DE) | 2023-08-16 | — | — | EP | claimed |
| EP-4048751-A1 | POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE | CMC Materials, Inc. (US) | 2022-08-31 | — | — | EP | claimed |
| CN-114599753-A | Polishing composition and method with high selectivity for silicon nitride and polysilicon versus silicon oxide | CMC材料股份有限公司 | 2022-06-07 | — | — | CN | claimed |
| WO-2021081145-A1 | POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE | CMC MATERIALS, INC. (US) | 2021-04-29 | — | — | WO | claimed |
| US-20210115297-A1 | POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE | CMC MATERIALS LLC | 2021-04-22 | — | — | US | claimed |
| CN-106795261-B | Polyurethane catalysts based on salts of sulfur | 赢创运营有限公司 | 2020-04-21 | — | — | CN | claimed |
| US-10570245-B2 | Polyurethane catalysts from sulfur based salts | EVONIK OPERATIONS GMBH (DE) | 2020-02-25 | — | — | US | claimed |
| US-10472459-B2 | Polyurethane catalysts from a sulfur based salts | EVONIK DEGUSSA GMBH (DE) | 2019-11-12 | — | — | US | claimed |
| EP-0841340-B1 | SUBSTITUTED BENZENEDITHIOL-METAL COMPLEXES | SUMITOMO SEIKA CHEMICALS (JP) | 2002-06-19 | — | — | EP | claimed |
| US-5856520-A | OPTICAL RECORDING MEDIA | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 1999-01-05 | — | — | US | claimed |
| EP-0841340-A1 | SUBSTITUTED BENZENEDITHIOL-METAL COMPLEXES | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 1998-05-13 | — | — | EP | claimed |
| EP-0249125-B1 | PROCESS FOR THE PRODUCTION OF AN ELECTRICALLY CONDUCTIVE SURFACE LAYER ON MOULDED PLASTIC ARTICLES | BASF Aktiengesellschaft (DE) | 1991-10-16 | — | — | EP | claimed |
| US-4897289-A | DISSOVING OR SWELLING THE SURFACE WITH A SOLVENT AND APPLYING AN ORGANIC ELECTRON ACCEPTOR, ORGANIC ELECTRON DONORS AND/OR IODIDES | BASF AKTIENGESELLSCHAFT (DE) | 1990-01-30 | — | — | US | claimed |
| US-4885368-A | SEMICONDUCTORS, PHOTOCONDUCTORS, ELECTRODES, BATTERIES | BASF AKTIENGESELLSCHAFT (DE) | 1989-12-05 | — | — | US | claimed |
| EP-0206266-B1 | RADICAL-ION SALTS | BASF Aktiengesellschaft (DE) | 1989-08-23 | — | — | EP | claimed |
| EP-0293749-A1 | N,N'-Biscyano-p-benzoquinonebisimines, charge-transfer complexes containing them and radical-ion salts of the biscyano-benzoquinonebisimines | BASF Aktiengesellschaft (DE) | 1988-12-07 | — | — | EP | claimed |
| EP-0249125-A2 | Process for the production of an electrically conductive surface layer on moulded plastic articles | BASF Aktiengesellschaft (DE) | 1987-12-16 | — | — | EP | claimed |
| EP-0206266-A2 | Radical-ion salts | BASF Aktiengesellschaft (DE) | 1986-12-30 | — | — | EP | claimed |