SCHEMBL756933

SCHEMBL756933

C=COC1CCc2ccccc21

nearest known ligand 0.61

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 4/20 0.61
PDPK1 O15530 1/20 0.43
HTR1A P08908 4/20 0.42
CYP11B2 P19099 1/20 0.41
GPR84 Q9NQS5 1/20 0.40
SIGMAR1 Q99720 1/20 0.39
ACP3 P15309 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4209937 0.89 IDO1 (0.64) IDO1GPR84
SCHEMBL18107695 0.84 IDO1 (0.39) IDO1
SCHEMBL17310830 0.83 IDO1 (0.59) IDO1PDPK1CYP11B2GPR84SIGMAR1
SCHEMBL14234001 0.83 IDO1 (0.59) IDO1PDPK1CYP11B2GPR84ACP3
SCHEMBL58026 0.83 IDO1 (0.59) IDO1PDPK1CYP11B2GPR84ACP3
SCHEMBL447419 0.80 IDO1 (0.66) IDO1PDPK1CYP11B2GPR84
SCHEMBL376248 0.79 IDO1 (0.70) IDO1PDPK1CYP11B2GPR84
SCHEMBL17310949 0.79 IDO1 (0.54) IDO1PDPK1HTR1AGPR84
SCHEMBL30462590 0.79 IDO1 (0.54) IDO1PDPK1HTR1AGPR84SIGMAR1
SCHEMBL31564967 0.76 IDO1 (0.51) IDO1HTR1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102558963-A Radiation curable ink capable of directly jetting ink on surface of ultraviolet light cured coating and preparation method thereof JANUS DONGGUAN PREC COMPONENTS 2012-07-11 CN claimed
EP-2669342-B1 ACTIVE-ENERGY-RAY-CURABLE INKJET INK COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INKJET INK, AND INKJET RECORDING METHOD KONICA MINOLTA INC (JP) 2020-03-18 EP disclosed
US-9416289-B2 Active-energy-ray-curable inkjet ink composition, active-energy-ray-curable inkjet ink, and inkjet recording method Konica Minolta, Inc. (JP) 2016-08-16 US disclosed
EP-2230283-B1 Actinic energy radiation curable ink-jet ink and ink-jet recording method KONICA MINOLTA IJ TECHNOLOGIES (JP) 2014-07-02 EP disclosed
EP-2669342-A1 ACTIVE-ENERGY-RAY-CURABLE INKJET INK COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INKJET INK, AND INKJET RECORDING METHOD Konica Minolta, Inc. (JP) 2013-12-04 EP disclosed
US-20130307913-A1 ACTIVE-ENERGY-RAY-CURABLE INKJET INK COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE INKJET INK, AND INKJET RECORDING METHOD Konica Minolta, Inc. (JP) 2013-11-21 US disclosed
CN-102558963-B Radiation curable ink capable of directly jetting ink on surface of ultraviolet light cured coating and preparation method thereof JANUS DONGGUAN PREC COMPONENTS 2013-10-23 CN disclosed
US-8507583-B2 Actinic energy radiation curable ink-jet ink and ink-jet recording method KONICA MINOLTA IJ TECHNOLOGIES, INC. (JP) 2013-08-13 US disclosed
US-8349916-B2 Actinic energy radiation curable ink-jet ink, ink-jet recording method, and printed matter KONICA MINOLTA IJ TECHNOLOGIES, INC. (JP) 2013-01-08 US disclosed
CN-102558963-A Radiation curable ink capable of directly jetting ink on surface of ultraviolet light cured coating and preparation method thereof JANUS DONGGUAN PREC COMPONENTS 2012-07-11 CN disclosed
US-20100239777-A1 ACTINIC ENERGY RADIATION CURABLE INK-JET INK AND INK-JET RECORDING METHOD KONICA MINOLTA IJ TECHNOLOGIES, INC. (JP) 2010-09-23 US disclosed
EP-2230283-A1 Actinic energy radiation curable ink-jet ink and ink-jet recording method Konica Minolta IJ Technologies, Inc. (JP) 2010-09-22 EP disclosed
US-20100233446-A1 ACTINIC ENERGY RADIATION CURABLE INK-JET INK, INK-JET RECORDING METHOD, AND PRINTED MATTER KONICA MINOLTA IJ TECHNOLOGIES, INC. (JP) 2010-09-16 US disclosed
EP-2228415-A1 Acting energy radiation curable ink-jet ink, ink-jet recoring method, and printed matter Konica Minolta IJ Technologies, Inc. (JP) 2010-09-15 EP disclosed
US-20090202947-A1 Positive resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO.,LTD (JP) 2009-08-13 US disclosed
US-7510820-B2 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-31 US disclosed
US-7510820-B2 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-31 US disclosed
JP-2008137974-A 1-INDANYL VINYL ETHER NIPPON CARBIDE IND CO INC 2008-06-19 JP disclosed
US-20070122740-A1 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-31 US disclosed
US-20070122740-A1 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-31 US disclosed