⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL29169695 | 0.98 | — | — | |
| SCHEMBL156748 | 0.79 | ALDH1A1 (0.37) | — | |
| SCHEMBL7212164 | 0.77 | ALPL (0.34) | — | |
| SCHEMBL168083 | 0.75 | — | — | |
| SCHEMBL175731 | 0.75 | ALDH1A1 (0.34) | — | |
| SCHEMBL11584118 | 0.75 | — | — | |
| SCHEMBL4577350 | 0.72 | — | — | |
| SCHEMBL14498872 | 0.72 | — | — | |
| SCHEMBL11584813 | 0.72 | KMT2A (0.40) | — | |
| SCHEMBL175730 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 474 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260043144-A1 | COPPER ETCHANT | MEC COMPANY LTD. (JP) | 2026-02-12 | — | — | US | claimed |
| US-12550694-B2 | Selective deposition for integrated circuit interconnect structures | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-02-10 | — | — | US | claimed |
| US-20250320340-A1 | PROCESSES FOR PRODUCING FILLED POLYOL COMPOSITIONS | COVESTRO LLC (US) | 2025-10-16 | — | — | US | claimed |
| EP-4624628-A1 | COPPER ETCHANT | MEC COMPANY., LTD. (JP) | 2025-10-01 | — | — | EP | claimed |
| CN-120006293-A | Microetching super-roughening liquid for enhancing bonding force between copper surface of PCB and resin and application thereof | 中山大学 | 2025-05-16 | — | — | CN | claimed |
| US-12278143-B2 | Method of providing a workpiece including low resistance interconnect low-resistance interconnect | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-04-15 | — | — | US | claimed |
| EP-4419619-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | Entegris, Inc. (US) | 2024-08-28 | — | — | EP | claimed |
| US-20240258166-A1 | SELECTIVE DEPOSITION FOR INTEGRATED CIRCUIT INTERCONNECT STRUCTURES | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-08-01 | — | — | US | claimed |
| EP-4396253-A1 | FILLED POLYOL COMPOSITIONS THAT INCLUDE A TRIAZOLE | Covestro LLC (US) | 2024-07-10 | — | — | EP | claimed |
| CN-118256249-A | Etching composition and application thereof | 宁波安集微电子科技有限公司 | 2024-06-28 | — | — | CN | claimed |
| EP-0673783-B1 | Recording sheets containing purine, pyrimidine, benzimidazole, imidazolidine, urazole, pyrazole, triazole, benzotriazole, tetrazole, and pyrazine compounds | XEROX CORP (US) | 2000-07-05 | — | — | EP | claimed |
| US-5659348-A | APPLYING TO A SUBSTRATE | XEROX CORPORATION (US) | 1997-08-19 | — | — | US | claimed |
| EP-0743574-A2 | Migration imaging members | XEROX CORPORATION (US) | 1996-11-20 | — | — | EP | claimed |
| EP-0743573-A2 | Method for obtaining image contrast migration imaging members | XEROX CORPORATION (US) | 1996-11-20 | — | — | EP | claimed |
| US-5563014-A | SOFTENABLE LAYER CONTAINIG PHOTOSENSITIVE MARKING MATERIAL; TRANSPARENTIZING AGENT | XEROX CORPORATION (US) | 1996-10-08 | — | — | US | claimed |
| US-5514505-A | SELECTIVE TRANSPARENTIZATION OF PHOTOSENSITIVE MIGRATION MARKING PARTICLES EMBEDDED NEAR THE SURFACE OF A SOFTENABLE LAYER SUPPORTED BY AN ELECTROCONDUCTIVE SUBSTRATE | XEROX CORPORATION (US) | 1996-05-07 | — | — | US | claimed |
| EP-0673783-A2 | Recording sheets containing purine, pyrimidine, benzimidazole, imidazolidine, urazole, pyrazole, triazole, benzotriazole, tetrazole, and pyrazine compounds | XEROX CORPORATION (US) | 1995-09-27 | — | — | EP | claimed |
| US-5191080-A | Method for preparing tetraazaindenes | EASTMAN KODAK COMPANY (US) | 1993-03-02 | — | — | US | claimed |
| EP-0487687-A1 | PROCESS AND INTERMEDIATES FOR THE PREPARATION OF TETRAAZAINDENES USEFUL IN PHOTOGRAPHY | EASTMAN KODAK COMPANY (US) | 1992-06-03 | — | — | EP | claimed |
| WO-1992000291-A1 | PROCESS AND INTERMEDIATES FOR THE PREPARATION OF TETRAAZAINDENES USEFUL IN PHOTOGRAPHY | EASTMAN KODAK COMPANY (US) | 1992-01-09 | — | — | WO | claimed |