Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 7/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.48 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.48 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | PGR | P06401 | 1/20 | 0.39 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.39 |
| ▸ | AR | P10275 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.39 |
| ▸ | DRD1 | P21728 | 1/20 | 0.39 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9714564 | 0.85 | ESR1 (0.50) | ESR1ESR2PDCD1CD274TDP1 | |
| SCHEMBL28423174 | 0.81 | LMNA (0.43) | TDP1CYP2C9ALOX15LMNACHRM2 | |
| SCHEMBL27593316 | 0.79 | ESR1 (0.43) | ESR1ESR2PDCD1CD274TDP1 | |
| SCHEMBL351626 | 0.76 | ESR1 (0.54) | ESR1ESR2PDCD1CD274TDP1 | |
| SCHEMBL17771940 | 0.73 | ESR1 (0.46) | ESR1ESR2PDCD1CD274TDP1 | |
| SCHEMBL15018764 | 0.73 | ESR1 (0.44) | ESR1ESR2PDCD1CD274TDP1 | |
| SCHEMBL30399481 | 0.72 | IDO1 (0.43) | ESR1ESR2PDCD1CD274TDP1 | |
| SCHEMBL4247422 | 0.71 | ESR1 (0.68) | ESR1ESR2PDCD1CD274TDP1 | |
| SCHEMBL11949347 | 0.71 | ESR1 (0.68) | ESR1ESR2PDCD1CD274TDP1 | |
| SCHEMBL29351491 | 0.71 | ESR1 (0.68) | ESR1ESR2PDCD1CD274TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0742490-B1 | Positive acid catalized resists | SHIPLEY CO LLC (US) | 2002-06-12 | — | — | EP | disclosed |
| US-5945516-A | PRIOR TO ESTERIFICATION OF THE POLYHYDROXY PHENOL WITH THE NAPHTHOQUINONE DIAZIDE SULFONYL HALIDE, THE REACTANTS ARE INITIALLY DISSOLVED IN AN APROTIC SOLVENT TOGETHER WITH STRONG BASE; NONPRECIPITATING, FOR FORMATION OF PHOTORESISTS | SHIPLEY COMPANY, L.L.C. (US) | 1999-08-31 | — | — | US | disclosed |
| US-5917024-A | Acid labile photoactive composition | SHIPLEY COMPANY, L.L.C. (US) | 1999-06-29 | — | — | US | disclosed |
| US-5858605-A | PHOTORESIST COATING COMPRISING ALKALI SOLUBLE RESIN AND PHOTOACTIVE COMPOUND, REACTION PRODUCT OF VINYL ETHER AND ORTHO-NAPHTHOQUINONEDIAZIDE SULFONYL COMPOUND, DISSOLVED IN SOLVENT | SHIPLEY COMPANY, L.L.C. (US) | 1999-01-12 | — | — | US | disclosed |
| US-5827634-A | FOR DEEP ULTRAVIOLET EXPOSURE; RESOLUTION | SHIPLEY COMPANY, L.L.C. (US) | 1998-10-27 | — | — | US | disclosed |
| US-5821345-A | DISSOLVING WITH A STRONG BASE AND APROTIC SOLVENT; ESTER INTERCHANGE | SHIPLEY COMPANY, L.L.C. (US) | 1998-10-13 | — | — | US | disclosed |
| US-5763536-A | PHOTORESIST BINDER CONSISTING OF NOVOLAK RESIN OR POLYVINYLPHENOL RESIN | SHIPLEY COMPANY, L.L.C. (US) | 1998-06-09 | — | — | US | disclosed |
| US-5731386-A | Polymer for positive acid catalyzed resists | SHIPLEY COMPANY, L.L.C. (US) | 1998-03-24 | — | — | US | disclosed |
| US-5719003-A | Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers | SHIPLEY COMPANY, L.L.C. (US) | 1998-02-17 | — | — | US | disclosed |
| US-5700624-A | Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups | SHIPLEY COMPANY, L.L.C. (US) | 1997-12-23 | — | — | US | disclosed |
| US-5648194-A | HIGH SPEED | SHIPLEY COMPANY, L.L.C. (US) | 1997-07-15 | — | — | US | disclosed |
| US-5641604-A | Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers | SHIPLEY COMPANY, L.L.C. (US) | 1997-06-24 | — | — | US | disclosed |
| EP-0742490-A1 | Positive acid catalized resists | Shipley Company LLC (US) | 1996-11-13 | — | — | EP | disclosed |