SCHEMBL7576801

SCHEMBL7576801

CCCS(=O)(=O)[O-].O=[N+]([O-])c1cccc([I+]c2cccc([N+](=O)[O-])c2)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.44
LMNA P02545 2/20 0.44
KMT2A Q03164 2/20 0.44
GAA P10253 1/20 0.44
HTT P42858 1/20 0.44
ACHE P22303 2/20 0.42
CA2 P00918 2/20 0.42
CA5A P35218 1/20 0.42
MAOA P21397 1/20 0.41
MAOB P27338 1/20 0.41
MEN1 O00255 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2C19 P33261 1/20 0.41
ALDH1A1 P00352 4/20 0.41
USP2 O75604 1/20 0.41
HPGD P15428 1/20 0.41
XBP1 P17861 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
CYP19A1 P11511 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7583310 0.91 TSHR (0.50) TSHRLMNAKMT2AGAAHTT
SCHEMBL2903790 0.89 NPSR1 (0.51) TSHRLMNAKMT2AGAAHTT
SCHEMBL7583669 0.85 TSHR (0.53) TSHRLMNAKMT2AGAAHTT
SCHEMBL29601516 0.81 TSHR (0.67) TSHRLMNAKMT2AGAAHTT
SCHEMBL143162 0.81 TSHR (0.67) TSHRLMNAKMT2AGAAHTT
Bromide SCHEMBL31058252 0.79 TSHR (0.64) TSHRLMNAKMT2AGAAHTT
SCHEMBL31145718 0.79 TSHR (0.64) TSHRLMNAKMT2AGAAHTT
SCHEMBL8331382 0.78 TSHR (0.48) TSHRLMNAKMT2AGAAHTT
Sulfuric Acid SCHEMBL4556409 0.78 LMNA (0.48) TSHRLMNAKMT2AGAAHTT
Trifluoromethanesulfonic Acid SCHEMBL2902298 0.78 TSHR (0.48) TSHRLMNAKMT2AGAAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed