SCHEMBL7578557

SCHEMBL7578557

C=CC(=O)OCC(CC)(CO)CO.C=CCOCC=C

nearest known ligand 0.64

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.64
TP53 P04637 3/20 0.64
HIF1A Q16665 3/20 0.64
CYP3A4 P08684 2/20 0.64
MAPK1 P28482 1/20 0.64
SMN1; SMN2 Q16637 1/20 0.64
THRB P10828 1/20 0.54
TSHR P16473 8/20 0.39
HPGD P15428 1/20 0.39
HSD17B10 Q99714 1/20 0.38
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL134216 0.90 ALDH1A1 (0.78) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL17685546 0.89 ALDH1A1 (0.75) ALDH1A1TP53HIF1ACYP3A4MAPK1
Formaldehyde SCHEMBL23716978 0.89 ALDH1A1 (0.75) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL12607048 0.87 THRB (0.66) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL28389145 0.87 ALDH1A1 (0.68) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL7578564 0.87 THRB (0.66) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL14409218 0.87 ALDH1A1 (0.68) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL22264522 0.87 ALDH1A1 (0.78) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL9577936 0.87 ALDH1A1 (0.78) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL11582712 0.86 ALDH1A1 (0.43) ALDH1A1TP53HIF1ACYP3A4MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117510738-A Impact modifier for resin and preparation method thereof 山东金昌树新材料股份有限公司 2024-02-06 CN claimed
CN-117402300-A Organosilicon-containing impact modifier for resin and preparation method thereof 山东金昌树新材料股份有限公司 2024-01-16 CN claimed
CN-117384324-A Anti-whitening modifier for resin and preparation method thereof 山东金昌树新材料股份有限公司 2024-01-12 CN claimed
US-4253918-A FOR PAPER SUBSTRATES PFIZER INC. (US) 1981-03-03 US claimed
CN-117510738-A Impact modifier for resin and preparation method thereof 山东金昌树新材料股份有限公司 2024-02-06 CN disclosed
CN-117402300-A Organosilicon-containing impact modifier for resin and preparation method thereof 山东金昌树新材料股份有限公司 2024-01-16 CN disclosed
CN-117384324-A Anti-whitening modifier for resin and preparation method thereof 山东金昌树新材料股份有限公司 2024-01-12 CN disclosed
CN-109310890-B Composition containing latex particles and UV absorber 罗门哈斯公司 2021-11-02 CN disclosed
CN-107949367-B Skin care compositions 罗门哈斯公司 2021-07-09 CN disclosed
EP-0972215-B1 RETROREFLECTIVE ARTICLE COMPRISING A CRYSTALLINE BEAD BOND LAYER MINNESOTA MINING & MFG (US) 2002-09-25 EP disclosed
US-6156436-A Use of a crystalline bead bond layer in a retroreflective article 3M INNOVATIVE PROPERTIES COMPANY (US) 2000-12-05 US disclosed
EP-0972215-A1 USE OF A CRYSTALLINE BEAD BOND LAYER IN A RETROREFLECTIVE ARTICLE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 2000-01-19 EP disclosed
WO-1998045735-A9 USE OF A CRYSTALLINE BEAD BOND LAYER IN A RETROREFLECTIVE ARTICLE MINNESOTA MINING & MFG (US) 1999-12-09 WO disclosed
WO-1998045735-A1 USE OF A CRYSTALLINE BEAD BOND LAYER IN A RETROREFLECTIVE ARTICLE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1998-10-15 WO disclosed