Known targets — ChEMBL curated mechanism
ADORA1ADORA2AADORA2BADORA3PDE3APDE3BPDE4APDE4BPDE4CPDE4D
The experimentally established mechanism targets of Methyl Phosphonate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLRA1 | P23415 | 1/20 | 0.62 |
| ▸ | SLC6A9 | P48067 | 1/20 | 0.62 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.62 |
| ▸ | CA2 | P00918 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | BLM | P54132 | 3/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | GABBR2 | O75899 | 4/20 | 0.42 |
| ▸ | GABBR1 | Q9UBS5 | 4/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.42 |
| ▸ | THPO | P40225 | 1/20 | 0.42 |
| ▸ | GABRR1 | P24046 | 4/20 | 0.40 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | GGH | Q92820 | 1/20 | 0.35 |
| ▸ | CTSC | P53634 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methyl Phosphonate SCHEMBL15419630 | 1.00 | GLRA1 (0.62) | GLRA1SLC6A9OR51E2CA2TSHR | |
| Glycine SCHEMBL27717185 | 0.94 | GLRA1 (0.62) | GLRA1SLC6A9OR51E2CA2TSHR | |
| Methyl Phosphonate SCHEMBL29127321 | 0.89 | GLRA1 (0.50) | GLRA1SLC6A9OR51E2CA2TSHR | |
| Methyl Phosphonate SCHEMBL28726099 | 0.87 | GLRA1 (0.48) | GLRA1SLC6A9OR51E2CA2TSHR | |
| Glycine SCHEMBL29130842 | 0.87 | GLRA1 (0.71) | GLRA1SLC6A9OR51E2TSHRLMNA | |
| Glycine SCHEMBL1023304 | 0.87 | GLRA1 (0.71) | GLRA1SLC6A9OR51E2TSHRLMNA | |
| Glycine SCHEMBL9274191 | 0.87 | GLRA1 (0.71) | GLRA1SLC6A9OR51E2TSHRLMNA | |
| Glycine SCHEMBL28244367 | 0.84 | GLRA1 (0.67) | GLRA1SLC6A9OR51E2TSHRLMNA | |
| Glycine SCHEMBL15419631 | 0.84 | GLRA1 (0.50) | GLRA1SLC6A9OR51E2CA2TSHR | |
| Glycine SCHEMBL28466543 | 0.82 | GLRA1 (0.56) | GLRA1SLC6A9OR51E2TSHRLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113277807-B | Super-retarding concrete for pile foundation and preparation method thereof | 北京建工新型建材有限责任公司 | 2022-11-15 | — | — | CN | claimed |
| CN-113277807-A | Super-retarding concrete for pile foundation and preparation method thereof | 北京建工新型建材有限责任公司 | 2021-08-20 | — | — | CN | claimed |
| EP-2852650-B1 | CMP COMPOSITION CONTAINING ZIRCONIA PARTICLES AND METHOD OF USE | CABOT MICROELECTRONICS CORP (US) | 2020-07-29 | — | — | EP | claimed |
| EP-1934015-B1 | CMP OF COPPER/RUTHENIUM SUBSTRATES | CABOT MICROELECTRONICS CORP (US) | 2012-03-21 | — | — | EP | claimed |
| EP-1934015-A1 | CMP OF COPPER/RUTHENIUM SUBSTRATES | CABOT MICROELECTRONICS CORPORATION (US) | 2008-06-25 | — | — | EP | claimed |
| US-7265055-B2 | CMP of copper/ruthenium substrates | CABOT MICROELECTRONICS CORPORATION (US) | 2007-09-04 | — | — | US | claimed |
| WO-2007050313-A1 | CMP OF COPPER/RUTHENIUM SUBSTRATES | CABOT MICROELECTRONICS CORPORATION (US) | 2007-05-03 | — | — | WO | claimed |
| US-20070090094-A1 | CMP of copper/ruthenium substrates | CABOT MICROELECTRONICS CORPORATION (US) | 2007-04-26 | — | — | US | claimed |
| US-6541434-B2 | Comprises carboxylic acid, amine, phosphonic acid, and water; for removing abrasives and metals from wafers | CABOT MICROELECTRONICS CORPORATION | 2003-04-01 | — | — | US | claimed |
| US-20020169088-A1 | Cleaning solution for semiconductor surfaces following chemical-mechanical polishing | QED TECHNOLOGIES INTERNATIONAL, INC. | 2002-11-14 | — | — | US | claimed |
| US-6395693-B1 | USING ABRASIVE PARTICLES IN MIXTURE OF AMINES, PHOSPHONIC ACID, ACID AND WATER | CABOT MICROELECTRONICS CORPORATION | 2002-05-28 | — | — | US | claimed |
| CN-118000033-A | Sugarcane planting method for sandy yellow loam | 广西大学 | 2024-05-10 | — | — | CN | disclosed |
| CN-116693575-A | Method for extracting and recovering glyphosate and glyphosate from glyphosate wastewater | 湖北三峡实验室 | 2023-09-05 | — | — | CN | disclosed |
| CN-113277807-B | Super-retarding concrete for pile foundation and preparation method thereof | 北京建工新型建材有限责任公司 | 2022-11-15 | — | — | CN | disclosed |
| CN-113277807-A | Super-retarding concrete for pile foundation and preparation method thereof | 北京建工新型建材有限责任公司 | 2021-08-20 | — | — | CN | disclosed |
| WO-2007050313-A1 | CMP OF COPPER/RUTHENIUM SUBSTRATES | CABOT MICROELECTRONICS CORPORATION (US) | 2007-05-03 | — | — | WO | disclosed |
| US-20070090094-A1 | CMP of copper/ruthenium substrates | CABOT MICROELECTRONICS CORPORATION (US) | 2007-04-26 | — | — | US | disclosed |
| US-6541434-B2 | Comprises carboxylic acid, amine, phosphonic acid, and water; for removing abrasives and metals from wafers | CABOT MICROELECTRONICS CORPORATION | 2003-04-01 | — | — | US | disclosed |
| US-20020169088-A1 | Cleaning solution for semiconductor surfaces following chemical-mechanical polishing | QED TECHNOLOGIES INTERNATIONAL, INC. | 2002-11-14 | — | — | US | disclosed |
| US-6395693-B1 | USING ABRASIVE PARTICLES IN MIXTURE OF AMINES, PHOSPHONIC ACID, ACID AND WATER | CABOT MICROELECTRONICS CORPORATION | 2002-05-28 | — | — | US | disclosed |