Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | NAAA | Q02083 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6334836 | 0.88 | CYP19A1 (0.31) | CYP19A1ALDH1A1NAAA | |
| SCHEMBL19919375 | 0.88 | ALDH1A1 (0.34) | CYP19A1ALDH1A1NAAA | |
| SCHEMBL18973456 | 0.88 | ALDH1A1 (0.34) | CYP19A1ALDH1A1NAAA | |
| SCHEMBL28138951 | 0.84 | NAAA (0.39) | CYP19A1ALDH1A1NAAA | |
| SCHEMBL75841 | 0.83 | NAAA (0.32) | CYP19A1ALDH1A1NAAA | |
| Ethylene Glycol SCHEMBL28293687 | 0.83 | NPSR1 (0.39) | CYP19A1ALDH1A1NAAA | |
| SCHEMBL45476 | 0.82 | NAAA (0.40) | CYP19A1ALDH1A1NAAA | |
| SCHEMBL17738165 | 0.81 | CYP19A1 (0.32) | CYP19A1ALDH1A1 | |
| SCHEMBL12892480 | 0.81 | GRM5 (0.32) | NAAA | |
| SCHEMBL3281463 | 0.79 | ALDH1A1 (0.41) | CYP19A1ALDH1A1NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8129100-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-8129100-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20090253084-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090253084-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |