SCHEMBL759054

SCHEMBL759054

C=CC(C)OCCC[Si](OC)(OC)OC

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28969563 0.79
SCHEMBL2401093 0.79 ALDH1A1 (0.36) LMNA
SCHEMBL2721247 0.75 LMNA (0.33) LMNA
SCHEMBL3225692 0.75 LMNA (0.33) LMNA
SCHEMBL10535267 0.75
SCHEMBL13819268 0.74 TSHR (0.34)
SCHEMBL822765 0.74
SCHEMBL8699147 0.74
SCHEMBL2400464 0.73 LMNA (0.36) LMNA
SCHEMBL7042406 0.73 LMNA (0.30) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9063419-B2 Photo-curing polysiloxane composition and application thereof CHI MEI CORPORATION (TW) 2015-06-23 US disclosed
US-8921024-B2 Photosensitive polysiloxane composition and applications thereof CHI MEI CORPORATION (TW) 2014-12-30 US disclosed
US-20140178819-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND APPLICATIONS THEREOF CHI MEI CORPORATION (TW) 2014-06-26 US disclosed
US-20130310497-A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATIONS THEREOF CHI MEI CORPORATION (TW) 2013-11-21 US disclosed
US-20130260108-A1 PHOTO-CURING POLYSILOXAN COMPOSITION AND APPLICATIONS THEREOF CHI MEI CORPORATION (TW) 2013-10-03 US disclosed
US-8546061-B2 Photo-curing polysiloxane composition and protective film formed from the same CHI MEI CORPORATION (TW) 2013-10-01 US disclosed
US-20130059963-A1 COATING COMPOSITION AND APPLICATIONS THEREOF CHI MEI CORPORATION (TW) 2013-03-07 US disclosed
US-8349461-B2 Photo-curing polysiloxane composition and protective film formed from the same CHI MEI CORPORATION (TW) 2013-01-08 US disclosed
US-20120141936-A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME CHI MEI CORPORATION (TW) 2012-06-07 US disclosed
US-20120052439-A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME CHI MEI CORPORATION (TW) 2012-03-01 US disclosed