SCHEMBL7593345

SCHEMBL7593345

CCCCCC(O)Oc1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CSNK1E P49674 1/20 0.45
LTA4H P09960 2/20 0.44
CNR2 P34972 1/20 0.44
ALDH1A1 P00352 1/20 0.41
CTRC Q99895 1/20 0.40
LMNA P02545 1/20 0.40
MLNR O43193 1/20 0.39
NR1I2 O75469 1/20 0.39
ESR1 P03372 1/20 0.39
NR3C1 P04150 1/20 0.39
PGR P06401 1/20 0.39
ADRB2 P07550 1/20 0.39
CHRM2 P08172 1/20 0.39
ADRB1 P08588 1/20 0.39
HTR1A P08908 1/20 0.39
ADRA2A P08913 1/20 0.39
ADORA3 P0DMS8 1/20 0.39
CHRM1 P11229 1/20 0.39
DRD2 P14416 1/20 0.39
ADRA2B P18089 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20608954 0.98 CSNK1E (0.47) CSNK1ELTA4HCNR2ALDH1A1CTRC
SCHEMBL20608951 0.98 CSNK1E (0.47) CSNK1ELTA4HCNR2ALDH1A1CTRC
SCHEMBL8205858 0.98 CSNK1E (0.47) CSNK1ELTA4HCNR2ALDH1A1CTRC
SCHEMBL6377998 0.98 CSNK1E (0.47) CSNK1ELTA4HCNR2ALDH1A1CTRC
SCHEMBL59745 0.94 LTA4H (0.44) CSNK1ELTA4HCNR2ALDH1A1LMNA
SCHEMBL27360717 0.89 CYP1A2 (0.45) CSNK1ECTRCCYP1A2CYP2C9CYP2C19
Anisole SCHEMBL27542548 0.88 CA4 (0.47) LTA4HCNR2DRD2DRD3GPR88
SCHEMBL9466958 0.87 CSNK1E (0.46) CSNK1ELTA4HCNR2ALDH1A1CTRC
SCHEMBL516763 0.86 LMNA (0.44) LTA4HALDH1A1LMNASLC6A4
Formic Acid SCHEMBL28126930 0.86 CNR2 (0.41) LTA4HCNR2ALDH1A1GPR88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112451425-A Skin moistening gel and preparation method thereof 重庆中佳信生物科技有限公司 2021-03-09 CN claimed
EP-4444822-A1 LIQUID CRYSTAL COMPOUNDS Rolic Technologies AG (CH) 2024-10-16 EP disclosed
WO-2023104545-A1 LIQUID CRYSTAL COMPOUNDS Rolic Technologies AG (CH) 2023-06-15 WO disclosed
CN-108291016-B Polycarbonate resin, method for producing same, and film 帝人株式会社 2021-08-17 CN disclosed
CN-112451425-A Skin moistening gel and preparation method thereof 重庆中佳信生物科技有限公司 2021-03-09 CN disclosed
US-10800879-B2 Polycarbonate resin, and production method and film thereof TEIJIN LIMITED (JP) 2020-10-13 US disclosed
US-20190010280-A1 POLYCARBONATE RESIN, AND PRODUCTION METHOD AND FILM THEREOF TEIJIN LIMITED (JP) 2019-01-10 US disclosed
US-9464167-B2 Poly α-amino acid and ferroelectric memory element using same AJINOMOTO CO., INC. (JP) 2016-10-11 US disclosed
US-9450174-B2 Piezoelectric element AJINOMOTO CO., INC. (JP) 2016-09-20 US disclosed
US-20140368083-A1 PIEZOELECTRIC ELEMENT AJINOMOTO CO., INC. (JP) 2014-12-18 US disclosed
US-20140138654-A1 POLY ALPHA-AMINO ACID AND FERROELECTRIC MEMORY ELEMENT USING SAME AJINOMOTO CO., INC. (JP) 2014-05-22 US disclosed
EP-1244756-A1 HIGH REFRACTIVE INDEX PRESSURE-SENSITIVE ADHESIVES 3M Innovative Properties Company (US) 2002-10-02 EP disclosed
WO-2001030933-A1 HIGH REFRACTIVE INDEX PRESSURE-SENSITIVE ADHESIVES 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-05-03 WO disclosed
US-4036862-A FOR POLYESTERS BAYER AKTIENGESELLSCHAFT (DT) 1977-07-19 US disclosed