Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Thiourea. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Thiourea SCHEMBL15353197 | 1.00 | TSHR (0.75) | — | |
| Thiourea SCHEMBL15353245 | 1.00 | TSHR (0.75) | — | |
| Thiourea SCHEMBL15353549 | 1.00 | TSHR (0.75) | — | |
| Thiourea SCHEMBL15353290 | 0.94 | TSHR (0.67) | — | |
| Thiourea SCHEMBL10390991 | 0.88 | — | — | |
| Thiourea SCHEMBL4933733 | 0.88 | — | — | |
| Thiourea SCHEMBL2232139 | 0.88 | — | — | |
| Thiourea SCHEMBL17728202 | 0.88 | TSHR (0.75) | — | |
| Thiourea SCHEMBL8979289 | 0.88 | — | — | |
| Thiourea SCHEMBL28878007 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013159864-A1 | PREPARATION OF SEMICONDUCTOR FILMS | MERCK PATENT GMBH (DE) | 2013-10-31 | — | — | WO | disclosed |
| EP-0926265-B1 | Method and compositions for producing copper surfaces for improved bonding and articles made therefrom | ATOTECH DEUTSCHLAND GMBH (DE) | 2002-11-13 | — | — | EP | disclosed |
| US-4072781-A | FERROMAGNETIC METAL, PHOSPHOROUS, COPPER, LEAD, SILICON | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-07 | — | — | US | disclosed |