Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 6/20 | 0.57 |
| ▸ | MAOA | P21397 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 4/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | TAS2R14 | Q9NYV8 | 1/20 | 0.36 |
| ▸ | CTBP2 | P56545 | 1/20 | 0.36 |
| ▸ | SIRT5 | Q9NXA8 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3480268 | 0.87 | MAOB (0.46) | MAOBMAOALMNAMAPTKMT2A | |
| SCHEMBL31008827 | 0.82 | MAOB (0.48) | MAOBLMNAMAPTSMN1; SMN2ALDH1A1 | |
| SCHEMBL29561503 | 0.80 | ESR1 (0.39) | MAOBMAPTHPGDALDH1A1KMT2A | |
| SCHEMBL758837 | 0.80 | ESR1 (0.39) | MAOBMAPTHPGDALDH1A1KMT2A | |
| SCHEMBL4545351 | 0.80 | KMT2A (0.40) | MAOBLMNAMAPTSMN1; SMN2HPGD | |
| Hydrochloric Acid SCHEMBL9331155 | 0.79 | ESR1 (0.38) | MAOBMAPTHPGDALDH1A1KMT2A | |
| SCHEMBL756534 | 0.77 | KMT2A (0.47) | MAOBMAPTHPGDALDH1A1KMT2A | |
| SCHEMBL30423338 | 0.75 | ESR2 (0.36) | MAOBMAPTHPGDALDH1A1KMT2A | |
| SCHEMBL30217958 | 0.75 | ESR1 (0.36) | MAOBMAPTHPGDALDH1A1KMT2A | |
| SCHEMBL29843345 | 0.75 | ESR1 (0.36) | MAOBMAPTHPGDALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024237033-A1 | COMPOSITION FOR SEMICONDUCTOR DEVICE PROCESSING AND METHOD FOR PRODUCING MODIFIED SUBSTRATE | 富士フイルム株式会社 | 2024-11-21 | — | — | WO | disclosed |
| CN-115210322-A | Resin composition, wiring board, and method for producing conductive pattern | 东丽株式会社 | 2022-10-18 | — | — | CN | disclosed |
| US-11422464-B2 | Photosensitive resin composition, method of producing electrically conductive pattern, substrate, touch panel, and display | TORAY INDUSTRIES, INC. (JP) | 2022-08-23 | — | — | US | disclosed |
| CN-109791352-B | Photosensitive resin composition, method for producing conductive pattern, substrate, touch panel, and display | 东丽株式会社 | 2022-07-29 | — | — | CN | disclosed |
| US-11127698-B2 | Method for producing conductive film, method for producing field effect transistor using same, and method for producing wireless communication device | TORAY INDUSTRIES, INC. (JP) | 2021-09-21 | — | — | US | disclosed |
| WO-2021095766-A1 | COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE, AND POLYMER | JSR株式会社 | 2021-05-20 | — | — | WO | disclosed |
| WO-2020250783-A1 | COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND POLYMER | JSR株式会社 | 2020-12-17 | — | — | WO | disclosed |
| US-20200203292-A1 | METHOD FOR PRODUCING CONDUCTIVE FILM, METHOD FOR PRODUCING FIELD EFFECT TRANSISTOR USING SAME, AND METHOD FOR PRODUCING WIRELESS COMMUNICATION DEVICE | TORAY INDUSTRIES, INC. (JP) | 2020-06-25 | — | — | US | disclosed |
| CN-106909028-B | Photosensitive resin composition, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2020-06-05 | — | — | CN | disclosed |
| CN-110809807-A | Method for manufacturing conductive film, method for manufacturing field effect transistor using same, and method for manufacturing wireless communication device | 东丽株式会社 | 2020-02-18 | — | — | CN | disclosed |
| US-8338510-B2 | Photosensitive siloxane composition, cured film formed therefrom and device having the cured film | TORAY INDUSTRIES, INC. (JP) | 2012-12-25 | — | — | US | disclosed |
| US-20120141936-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME | CHI MEI CORPORATION (TW) | 2012-06-07 | — | — | US | disclosed |
| US-20120052439-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME | CHI MEI CORPORATION (TW) | 2012-03-01 | — | — | US | disclosed |
| US-20110008730-A1 | POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM | JSR CORPORATION (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20100273109-A1 | METHOD FOR PRODUCING OPTICAL PART | CANON KABUSHIKI KAISHA (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2243622-A2 | Method for producing optical part | CANON KABUSHIKI KAISHA (JP) | 2010-10-27 | — | — | EP | disclosed |
| US-20100129618-A1 | PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM AND DEVICE HAVING THE CURED FILM | TORAY INDUSTRIES, INC. (JP) | 2010-05-27 | — | — | US | disclosed |
| US-7374856-B2 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES, INC. (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20060115766-A1 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES, INC. (JP) | 2006-06-01 | — | — | US | disclosed |
| EP-1662322-A2 | Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film | TORAY INDUSTRIES, INC. (JP) | 2006-05-31 | — | — | EP | disclosed |