SCHEMBL756534

SCHEMBL756534

Cc1ccccc1C[S+](C)c1ccc(OC(=O)c2ccccc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 13/20 0.47
MAPT P10636 7/20 0.47
ALDH1A1 P00352 4/20 0.47
TDP1 Q9NUW8 3/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
PKM P14618 1/20 0.47
PARP10 Q53GL7 1/20 0.46
MAOB P27338 1/20 0.44
MEN1 O00255 4/20 0.42
KDM4E B2RXH2 2/20 0.42
HPGD P15428 2/20 0.42
HSP90AA1 P07900 1/20 0.42
RAB9A P51151 1/20 0.42
ELANE P08246 1/20 0.41
GLA P06280 1/20 0.41
GAA P10253 1/20 0.41
NPBWR1 P48145 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31008827 0.86 MAOB (0.48) KMT2AMAPTALDH1A1PKMMAOB
SCHEMBL9226942 0.79 KMT2A (0.47) KMT2AMAPTALDH1A1TDP1L3MBTL1
SCHEMBL759545 0.77 MAOB (0.57) KMT2AMAPTALDH1A1MAOBMEN1
SCHEMBL28153865 0.75 KMT2A (0.52) KMT2AMAPTALDH1A1TDP1L3MBTL1
SCHEMBL28479224 0.74 KMT2A (0.50) KMT2AMAPTALDH1A1TDP1L3MBTL1
SCHEMBL756535 0.74 MAPT (0.53) KMT2AMAPTALDH1A1TDP1L3MBTL1
SCHEMBL29561503 0.74 ESR1 (0.39) KMT2AMAPTALDH1A1MAOBMEN1
SCHEMBL758837 0.74 ESR1 (0.39) KMT2AMAPTALDH1A1MAOBMEN1
SCHEMBL3201074 0.73 PARP10 (0.62) KMT2AMAPTALDH1A1TDP1L3MBTL1
SCHEMBL4545351 0.73 KMT2A (0.40) KMT2AMAPTALDH1A1TDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024237033-A1 COMPOSITION FOR SEMICONDUCTOR DEVICE PROCESSING AND METHOD FOR PRODUCING MODIFIED SUBSTRATE 富士フイルム株式会社 2024-11-21 WO disclosed
US-11422464-B2 Photosensitive resin composition, method of producing electrically conductive pattern, substrate, touch panel, and display TORAY INDUSTRIES, INC. (JP) 2022-08-23 US disclosed
US-11127698-B2 Method for producing conductive film, method for producing field effect transistor using same, and method for producing wireless communication device TORAY INDUSTRIES, INC. (JP) 2021-09-21 US disclosed
WO-2021095766-A1 COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE, AND POLYMER JSR株式会社 2021-05-20 WO disclosed
WO-2020250783-A1 COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND POLYMER JSR株式会社 2020-12-17 WO disclosed
US-20200203292-A1 METHOD FOR PRODUCING CONDUCTIVE FILM, METHOD FOR PRODUCING FIELD EFFECT TRANSISTOR USING SAME, AND METHOD FOR PRODUCING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES, INC. (JP) 2020-06-25 US disclosed
WO-2019193941-A1 METHOD OF FORMING CURED FILM AND CURABLE COMPOSITION JSR株式会社 2019-10-10 WO disclosed
US-20190265592-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF PRODUCING ELECTRICALLY CONDUCTIVE PATTERN, SUBSTRATE, TOUCH PANEL, AND DISPLAY TORAY INDUSTRIES, INC. (JP) 2019-08-29 US disclosed
EP-3521925-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ELECTRICALLY CONDUCTIVE PATTERN, SUBSTRATE, TOUCH PANEL, AND DISPLAY Toray Industries, Inc. (JP) 2019-08-07 EP disclosed
US-10351526-B2 Coloring curable resin composition, cured film, color filter, method for manufacturing color filter, solid-state imaging device, image display device, compound, and cation FUJIFILM CORPORATION (JP) 2019-07-16 US disclosed
US-20120052439-A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME CHI MEI CORPORATION (TW) 2012-03-01 US disclosed
US-20110008730-A1 POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM JSR CORPORATION (JP) 2011-01-13 US disclosed
US-20100316953-A1 SILOXANE-BASED RESIN COMPOSITION TORAY INDUSTRIES, INC. (JP) 2010-12-16 US disclosed
US-20100273109-A1 METHOD FOR PRODUCING OPTICAL PART CANON KABUSHIKI KAISHA (JP) 2010-10-28 US disclosed
EP-2243622-A2 Method for producing optical part CANON KABUSHIKI KAISHA (JP) 2010-10-27 EP disclosed
EP-2239301-A1 SILOXANE RESIN COMPOSITIONS Toray Industries, Inc. (JP) 2010-10-13 EP disclosed
US-20100129618-A1 PHOTOSENSITIVE SILOXANE COMPOSITION, CURED FILM FORMED THEREFROM AND DEVICE HAVING THE CURED FILM TORAY INDUSTRIES, INC. (JP) 2010-05-27 US disclosed
US-7374856-B2 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES, INC. (JP) 2008-05-20 US disclosed
US-20060115766-A1 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES, INC. (JP) 2006-06-01 US disclosed
EP-1662322-A2 Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film TORAY INDUSTRIES, INC. (JP) 2006-05-31 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100316953-A1 SILOXANE-BASED RESIN COMPOSITION ICAM1, ESD, CAD KMT2A 327/4885MAPT 2931/4885ALDH1A1 599/4885
US-10351526-B2 Coloring curable resin composition, cured film, color filter, method for manufacturing color filter, solid-state imaging device, image display device, compound, and cation O60361, WDR12, SEM1 KMT2A 1719/4885MAPT 1958/4885ALDH1A1 2079/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.