SCHEMBL7615935

SCHEMBL7615935

O=C(O)c1c(C(=O)O)c(C(=O)O)c2c(c1C(=O)O)=c1ccccc1=2

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.44
CA1 P00915 3/20 0.44
CA2 P00918 3/20 0.44
CA7 P43166 3/20 0.44
CA9 Q16790 3/20 0.44
CA14 Q9ULX7 3/20 0.44
ALDH1A1 P00352 5/20 0.43
NAPRT Q6XQN6 2/20 0.43
DAO P14920 1/20 0.43
TSHR P16473 1/20 0.43
ALOX15 P16050 1/20 0.43
KDM4E B2RXH2 2/20 0.43
HPGD P15428 2/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
CYP1A2 P05177 1/20 0.43
GLA P06280 1/20 0.43
CYP2C19 P33261 1/20 0.43
HSD17B10 Q99714 1/20 0.43
AKR1C3 P42330 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2999298 0.83 PDE10A (0.41) CA12CA1CA2CA7CA9
SCHEMBL1635941 0.74 LMNA (0.50) CA12CA1CA2CA7CA9
SCHEMBL11363772 0.74 LMNA (0.50) CA12CA1CA2CA7CA9
SCHEMBL5666483 0.74 ALDH1A1 (0.57) CA12CA1CA2CA7CA9
SCHEMBL829602 0.73 ALDH1A1 (0.44) CA12CA1CA2CA7CA9
SCHEMBL1666407 0.73 ALDH1A1 (0.56) CA12CA1CA2CA7CA9
SCHEMBL54422 0.72 KDM4E (0.58) CA12CA1CA2CA7CA9
Mellitic Acid SCHEMBL7862040 0.72 ALDH1A1 (0.82) CA12CA1CA2CA7CA9
Hydrochloric Acid SCHEMBL11418753 0.72 ALDH1A1 (0.43) CA12CA1CA2CA7CA9
SCHEMBL10405305 0.72 LMNA (0.48) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3631572-B1 DISPLAY SUBSTRATE, DISPLAY APPARATUS, AND METHOD OF FABRICATING DISPLAY SUBSTRATE BOE TECHNOLOGY GROUP CO LTD (CN) 2023-02-15 EP disclosed
US-11327355-B2 Display substrate, display apparatus, and method of fabricating display substrate BOE TECHNOLOGY GROUP CO., LTD. (CN) 2022-05-10 US disclosed
US-20210208453-A1 DISPLAY SUBSTRATE, DISPLAY APPARATUS, AND METHOD OF FABRICATING DISPLAY SUBSTRATE BOE TECHNOLOGY GROUP CO., LTD. (CN) 2021-07-08 US disclosed
EP-3631572-A1 DISPLAY SUBSTRATE, DISPLAY APPARATUS, AND METHOD OF FABRICATING DISPLAY SUBSTRATE Boe Technology Group Co. Ltd. (CN) 2020-04-08 EP disclosed
US-6495919-B2 Conductive implant structure in a dielectric MICRON TECHNOLOGY, INC. 2002-12-17 US disclosed
US-6432844-B1 Implanted conductor and methods of making MICRON TECHNOLOGY, INC. 2002-08-13 US disclosed
US-20010045659-A1 Conductive implant structure in a dielectric FARRAR PAUL A (US) 2001-11-29 US disclosed
US-6262486-B1 Conductive implant structure in a dielectric MICRON TECHNOLOGY, INC. 2001-07-17 US disclosed
US-6017829-A FORMING DIELECTRIC LAYER UPON SEMICONDUCTOR SUBSTRATE; DOPING METAL INTO DIELECTRIC LAYER TO FORM ELECTRICALLY CONDUCTIVE STRUCTURE WITHIN DIELECTRIC LAYER THAT EXTENDS TO TOP SURFACE OF DIELECTRIC LAYER MICRON TECHNOLOGY, INC. (US) 2000-01-25 US disclosed
US-5876507-A Fluid treatment device and method INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-03-02 US disclosed
US-5242713-A Metallizing polyimide film INTERNATIONAL BUSINESS MACHINES CORPORATION 1993-09-07 US disclosed
US-5203955-A Supplying electrons to redox sites of a polymer and then dissolving the polymer in an aprotic solvent INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1993-04-20 US disclosed
US-5152880-A Composition of polyimide, electrolyte and/or reducing agent; electrical bias; soluble polyimide in anion form INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1992-10-06 US disclosed
EP-0505880-A1 Electron induced transformation of an isoimide to an N-imide and uses thereof International Business Machines Corporation (US) 1992-09-30 EP disclosed
US-5135779-A Producing reversible redox sites on polyimide; contact with metal salts to form elemental metal; electron transfer; photoresists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1992-08-04 US disclosed
US-5045159-A Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and electrophilic methods of fabrication thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1991-09-03 US disclosed
US-5019210-A Method for enhancing the adhesion of polymer surfaces by water vapor plasma treatment INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1991-05-28 US disclosed
EP-0409003-A2 Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and electrophilic methods of fabrication thereof International Business Machines Corporation (US) 1991-01-23 EP disclosed
EP-0391068-A2 Method for enhancing the adhesion of polymer surfaces by water vapor plasma treatment International Business Machines Corporation (US) 1990-10-10 EP disclosed
EP-0374487-A2 Method for conditioning an organic polymeric material International Business Machines Corporation (US) 1990-06-27 EP disclosed