SCHEMBL7617723

SCHEMBL7617723

C=C(Cc1c(Cl)cc(Cl)cc1Cl)C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ AKR1B1 P15121 1/20 0.39
▸ AKR1C4 P17516 1/20 0.38
▸ AKR1C3 P42330 1/20 0.38
▸ AKR1C2 P52895 1/20 0.38
▸ AKR1C1 Q04828 1/20 0.38
▸ ERCC5 P28715 2/20 0.36
▸ FEN1 P39748 2/20 0.36
▸ TPMT P51580 1/20 0.35
▸ TSHR P16473 2/20 0.35
▸ CASP1 P29466 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ ALDH1A1 P00352 2/20 0.34
▸ CYP3A4 P08684 1/20 0.34
▸ RECQL P46063 1/20 0.34
▸ HSD17B10 Q99714 1/20 0.34
▸ L3MBTL1 Q9Y468 2/20 0.34
▸ LMNA P02545 1/20 0.34
▸ GPR17 Q13304 2/20 0.34
▸ TDP1 Q9NUW8 1/20 0.33
▸ GRIN1 Q05586 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5191843 0.79 AKR1B1 (0.61) AKR1B1AKR1C4AKR1C3AKR1C2AKR1C1
SCHEMBL10744564 0.78 TPMT (0.41) TPMTTSHRSMN1; SMN2ALDH1A1MEN1
SCHEMBL8467565 0.76 TP53 (0.46) ERCC5FEN1TSHRCASP1SMN1; SMN2
SCHEMBL11438536 0.74 TET2 (0.33) AKR1B1HSD17B10
SCHEMBL24135522 0.72 TSHR (0.39) AKR1B1TPMTTSHRCASP1SMN1; SMN2
SCHEMBL2366776 0.72 AKR1B1 (0.39) AKR1B1AKR1C4AKR1C3AKR1C2AKR1C1
SCHEMBL9978973 0.71 AKR1B1 (0.38) AKR1B1AKR1C4AKR1C3AKR1C2AKR1C1
SCHEMBL1629363 0.69 CTBP2 (0.56) ALDH1A1CYP3A4L3MBTL1LMNATDP1
SCHEMBL9978855 0.69 AKR1B1 (0.36) AKR1B1AKR1C4AKR1C3AKR1C2AKR1C1
SCHEMBL6901218 0.69 KDM4E (0.46) ALDH1A1L3MBTL1TDP1MEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0207551-A1 Process for obtaining a photosensitive polymer having a high resolution, developable by plasma, and photolithographic process using this polymer LABORATOIRES D'ELECTRONIQUE PHILIPS (FR) 1987-01-07 — — EP claimed
US-6432498-B1 Volume hologram laminate DAI NIPPON PRINTING CO., LTD. (JP) 2002-08-13 — — US disclosed
EP-0833870-A1 POLYMERS FOR ANTIFOULING COATINGS AND A PROCESS FOR THE PREPARATION THEREOF Jotun A/S (NO) 1998-04-08 — — EP disclosed
WO-1996041842-A1 POLYMERS FOR ANTIFOULING COATINGS AND A PROCESS FOR THE PREPARATION THEREOF JOTUN A/S (NO) 1996-12-27 — — WO disclosed
US-4816377-A Photolithographic method producing sub-micron patterns in the manufacture of electronic microcircuits U.S. PHILIPS CORPORATION (US) 1989-03-28 — — US disclosed
US-4741986-A High-resolution photosensitive composition which can be developed by plasma and a photolithographic method of using said composition U.S. PHILIPS CORP. (US) 1988-05-03 — — US disclosed
EP-0207551-A1 Process for obtaining a photosensitive polymer having a high resolution, developable by plasma, and photolithographic process using this polymer LABORATOIRES D'ELECTRONIQUE PHILIPS (FR) 1987-01-07 — — EP disclosed
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