Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.44 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14384743 | 1.00 | KMT2A (0.58) | KMT2AALDH1A1TDP1SMN1; SMN2PKM | |
| SCHEMBL15759448 | 0.85 | ALDH1A1 (0.52) | KMT2AALDH1A1TDP1SMN1; SMN2PKM | |
| SCHEMBL1006031 | 0.83 | ALDH1A1 (0.53) | KMT2AALDH1A1TDP1SMN1; SMN2PKM | |
| SCHEMBL2584632 | 0.82 | ALDH1A1 (0.55) | KMT2AALDH1A1TDP1SMN1; SMN2PKM | |
| SCHEMBL31143794 | 0.81 | KMT2A (0.67) | KMT2AALDH1A1TDP1SMN1; SMN2RAB9A | |
| SCHEMBL13700490 | 0.80 | ALDH1A1 (0.57) | KMT2AALDH1A1TDP1SMN1; SMN2PKM | |
| SCHEMBL21987044 | 0.80 | ALDH1A1 (0.57) | KMT2AALDH1A1TDP1SMN1; SMN2PKM | |
| SCHEMBL20919927 | 0.80 | ALDH1A1 (0.57) | KMT2AALDH1A1TDP1SMN1; SMN2PKM | |
| SCHEMBL24595901 | 0.79 | KMT2A (0.41) | KMT2AALDH1A1SMN1; SMN2MEN1L3MBTL1 | |
| SCHEMBL21987047 | 0.78 | ALDH1A1 (0.55) | KMT2AALDH1A1TDP1SMN1; SMN2PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118778361-B | Water-soluble acrylic photoresist | 广东科优材料科技有限公司 | 2024-12-20 | — | — | CN | claimed |
| CN-118778361-A | Water-soluble acrylic photoresist | 广东科优材料科技有限公司 | 2024-10-15 | — | — | CN | claimed |
| CN-118778361-B | Water-soluble acrylic photoresist | 广东科优材料科技有限公司 | 2024-12-20 | — | — | CN | disclosed |
| CN-118778361-A | Water-soluble acrylic photoresist | 广东科优材料科技有限公司 | 2024-10-15 | — | — | CN | disclosed |
| US-11780946-B2 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-11780946-B2 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-20210230332-A1 | ALTERNATING COPOLYMER, METHOD OF PRODUCING ALTERNATING COPOLYMER, METHOD OF PRODUCING POLYMERIC COMPOUND, AND METHOD OF FORMING RESIST PATTERN | NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT | 2021-07-29 | — | — | US | disclosed |
| US-8137891-B2 | Bakeable lithographic printing plates with a high resistance to chemicals | EASTMAN KODAK COMPANY (US) | 2012-03-20 | — | — | US | disclosed |
| US-8137891-B2 | Bakeable lithographic printing plates with a high resistance to chemicals | EASTMAN KODAK COMPANY (US) | 2012-03-20 | — | — | US | disclosed |
| US-20090269554-A1 | BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHEMICALS | KODAK (NEAR EAST) INC. | 2009-10-29 | — | — | US | disclosed |
| US-20090269554-A1 | BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHEMICALS | KODAK (NEAR EAST) INC. | 2009-10-29 | — | — | US | disclosed |
| WO-2007121871-A1 | BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHEMICALS | EASTMAN KODAK COMPANY (US) | 2007-11-01 | — | — | WO | disclosed |
| EP-1849600-A1 | Bakeable radiation-sensitive elements with a high resistance to chemicals | EASTMAN KODAK COMPANY (US) | 2007-10-31 | — | — | EP | disclosed |