SCHEMBL7626080

SCHEMBL7626080

C[SiH](Cl)[Si](C)(C)[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8727139 0.79
SCHEMBL9301124 0.70
SCHEMBL5885481 0.67
SCHEMBL896946 0.67
SCHEMBL8676221 0.65
SCHEMBL7642396 0.61
SCHEMBL5580867 0.61
SCHEMBL8085482 0.61
SCHEMBL11344682 0.61
SCHEMBL10579825 0.61 ALDH1A1 (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250215260-A1 SILPHENYLENE POLYMERS WACKER CHEMIE AG (DE) 2025-07-03 US disclosed
EP-4479479-A1 SILPHENYLENE POLYMERS Wacker Chemie AG (DE) 2024-12-25 EP disclosed
WO-2023222203-A1 SILPHENYLENE POLYMERS WACKER CHEMIE AG (DE) 2023-11-23 WO disclosed
US-6440615-B1 A REPAIR MEMBRANE IS FORMED IN THE DEFECTIVE PORTION OF THE MASK BY IRRADIATING A CHARGED PARTICLE BEAM TO SAID DEFECT WHILE A GAS INCLUDING SUBSTANCES HAVING HIGH SCATTERING PROPERTIES ARE SUPPLIED NIKON CORPORATION (JP) 2002-08-27 US disclosed