SCHEMBL7637528

SCHEMBL7637528

CC(C)CCCCc1ccccc1CCCCC(C)C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HIF1A Q16665 1/20 0.41
EPAS1 Q99814 1/20 0.41
LMNA P02545 1/20 0.40
LIPG Q9Y5X9 1/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
SLC6A3 Q01959 1/20 0.39
GABRA1 P14867 1/20 0.37
GABRB2 P47870 1/20 0.37
MMP9 P14780 1/20 0.37
BCHE P06276 1/20 0.36
MEN1 O00255 1/20 0.36
ALDH1A1 P00352 1/20 0.36
HTT P42858 1/20 0.36
KMT2A Q03164 1/20 0.36
CYP4F2 P78329 1/20 0.36
CYP4A11 Q02928 1/20 0.36
ADRB2 P07550 3/20 0.36
ADRB1 P08588 3/20 0.36
CYSLTR2 Q9NS75 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7632660 0.98 HIF1A (0.43) HIF1AEPAS1LMNALIPGSLC6A2
SCHEMBL30899680 0.98 HIF1A (0.43) HIF1AEPAS1LMNALIPGSLC6A2
SCHEMBL7637846 0.93 SLC6A2 (0.41) HIF1AEPAS1LMNALIPGSLC6A2
SCHEMBL10765378 0.90 LIPG (0.50) HIF1AEPAS1LIPGCYSLTR2CYSLTR1
SCHEMBL11803993 0.90 LIPG (0.42) HIF1AEPAS1LIPGGABRA1GABRB2
SCHEMBL28356255 0.90 LIPG (0.42) HIF1AEPAS1LIPGMMP9ADRB2
SCHEMBL28352315 0.90 LIPG (0.42) HIF1AEPAS1LIPGMMP9ADRB2
SCHEMBL10759492 0.90 LIPG (0.50) HIF1AEPAS1LIPGCYSLTR2CYSLTR1
SCHEMBL28564965 0.87 HIF1A (0.41) HIF1AEPAS1LIPGMMP9MEN1
Phosphoric Acid SCHEMBL28716195 0.87 ALDH1A1 (0.46) HIF1AEPAS1LIPGMMP9ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1233028-A1 OPTICAL MATERIAL COMPRISING STAR-SHAPED HYDROGENATED POLYSTYRENE BLOCK COPOLYMER, PROCESS FOR PRODUCING THE SAME, AND SUBSTRATE FOR OPTICAL DISK TEIJIN LIMITED (JP) 2002-08-21 EP disclosed