SCHEMBL7644654

SCHEMBL7644654

C=CC(=O)OC(O)(O)C1CC2CCC1C2

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.36
CYP19A1 P11511 1/20 0.31
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6732366 0.83 ATM (0.36) ATM
SCHEMBL5004824 0.83 ATM (0.36) ATM
SCHEMBL32688576 0.72 ATM (0.34) ATMCYP19A1POLB
SCHEMBL29353750 0.69 ATM (0.65) ATMCYP19A1POLB
SCHEMBL641536 0.69 ATM (0.65) ATMCYP19A1POLB
SCHEMBL23493883 0.67 ATM (0.49) ATMCYP19A1POLB
SCHEMBL4900373 0.67 SLC6A3 (0.33) ATMPOLB
SCHEMBL28204575 0.66 CYP19A1 (0.40) CYP19A1POLB
SCHEMBL23494082 0.66 ATM (0.51) ATMCYP19A1POLB
SCHEMBL1318677 0.66 MEN1 (0.39) ATMPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6469197-B1 A (METH)ACRYLATE DERIVATIVE WHOSE ESTER PORTION IS A 4,7-METHANOINDENE DIOL OR 1,4:5,8-DIMETHANONAPHTHALENE DIOL FOR MAKING PHOTORESIST POLYMERS NEC CORPORATION (JP) 2002-10-22 US disclosed
US-6146806-A Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same NEC CORPORATION (JP) 2000-11-14 US disclosed