SCHEMBL6732366

SCHEMBL6732366

C=CC(=O)OC(C)(C)C1CC2CCC1C2

nearest known ligand 0.36

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.36
RAB9A P51151 1/20 0.32
SLC6A3 Q01959 2/20 0.31
EPHX2 P34913 1/20 0.31
BRS3 P32247 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5004824 0.88 ATM (0.36) ATMRAB9ASLC6A3EPHX2BRS3
SCHEMBL7644654 0.83 ATM (0.36) ATM
SCHEMBL4900373 0.82 SLC6A3 (0.33) ATMSLC6A3EPHX2BRS3
SCHEMBL3674828 0.80 SLC6A3 (0.34) ATMRAB9ASLC6A3EPHX2BRS3
SCHEMBL16684205 0.79 SLC6A3 (0.33) ATMSLC6A3EPHX2BRS3
SCHEMBL1819178 0.78 SLC6A3 (0.31) SLC6A3EPHX2BRS3
SCHEMBL25802902 0.78 SLC6A3 (0.31) SLC6A3EPHX2BRS3
SCHEMBL19497268 0.76 KMT2A (0.37) RAB9ASLC6A3EPHX2
SCHEMBL120796 0.76 EPHX2 (0.40) RAB9ASLC6A3EPHX2BRS3
SCHEMBL9608692 0.76 KMT2A (0.37) RAB9ASLC6A3EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260078079-A1 FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES OSMO LABS PBC (US) 2026-03-19 US disclosed
US-11130913-B2 Liquid crystal alignment agent, liquid crystal alignment film, liquid crystal element, and polymer JSR CORPORATION (JP) 2021-09-28 US disclosed
US-20210198577-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, LIQUID CRYSTAL ELEMENT, AND POLYMER JSR CORPORATION (JP) 2021-07-01 US disclosed
US-20110054133-A1 RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-03-03 US disclosed
US-20110054133-A1 RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-03-03 US disclosed
US-20070264592-A1 Resist polymer, preparing method, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-15 US disclosed
US-20070264592-A1 Resist polymer, preparing method, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-15 US disclosed
US-7189492-B2 Photosensitive composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-03-13 US disclosed
US-7189492-B2 Photosensitive composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-03-13 US disclosed
US-6677419-B1 REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR INTERNATIONAL BUSINESS MACHINES CORPORATION 2004-01-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260078079-A1 FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES CBR1, CBR3, TAS2R1 ATM 4293/4885RAB9A 3885/4885SLC6A3 4858/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.