SCHEMBL7651246

SCHEMBL7651246

C=CC(=O)[C](C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL27318830 0.78 ALDH1A1 (0.50)
SCHEMBL3214909 0.76
SCHEMBL19643103 0.76 ALDH1A1 (0.56)
SCHEMBL3620018 0.76
Bicarbonate SCHEMBL29118444 0.75 ALDH1A1 (0.47)
Hydrogen Peroxide SCHEMBL4373442 0.74 ALDH1A1 (0.92)
Hydrogen Peroxide SCHEMBL4373439 0.74
SCHEMBL2751659 0.73
SCHEMBL75764 0.73
SCHEMBL277994 0.73 ALDH1A1 (0.45)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110235032-A Flexible color filter device and manufacturing method 艾瑞斯材料公司 2019-09-13 CN claimed
CN-104152131-B A kind of polymer oil-displacing agent containing sulphite structure and synthetic method thereof 西南石油大学 2016-09-14 CN claimed
JP-61197605-A None JP disclosed
CN-110235032-A Flexible color filter device and manufacturing method 艾瑞斯材料公司 2019-09-13 CN disclosed
CN-105764993-B Siliceous heat or Photocurable composition AZ电子材料(卢森堡)有限公司 2019-04-09 CN disclosed
CN-102859439-B Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof JSR株式会社 2017-06-30 CN disclosed
CN-102243386-B Liquid crystal display cells, positive radiation line sensitive compositions, interlayer dielectric used for liquid crystal display element and forming method thereof JSR株式会社 2016-08-10 CN disclosed
CN-105764993-A Silicon-containing heat- or photo-curable composition AZ电子材料(卢森堡)有限公司 2016-07-13 CN disclosed
CN-102870047-B Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof JSR CORP. (JP) 2016-03-02 CN disclosed
CN-101338177-B Liquid crystal sealing agent, (methyl) acrylic ester compounds used and manufacturing method thereof MITSU CHEMICALS INC 2012-07-11 CN disclosed
CN-101338177-A Liquid crystal sealing agent, (methyl) acrylic ester compounds used and manufacturing method thereof MITSUI CHEMICALS INC (JP) 2009-01-07 CN disclosed
US-6478412-B1 Piezoelectric thin film device, its production method, and ink-jet recording head KANSAI RESEARCH INSTITUTE (JP) 2002-11-12 US disclosed
JP-S61197605-A ALKALI-SOLUBLE PHOTOCURABLE COMPOSITION OSAKA YUKI KAGAKU KOGYO KK 1986-09-01 JP disclosed