Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.76 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.70 |
| ▸ | MEN1 | O00255 | 4/20 | 0.70 |
| ▸ | PABPC1 | P11940 | 2/20 | 0.70 |
| ▸ | RAB9A | P51151 | 1/20 | 0.70 |
| ▸ | ATM | Q13315 | 1/20 | 0.64 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.62 |
| ▸ | RECQL | P46063 | 1/20 | 0.56 |
| ▸ | GLA | P06280 | 1/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.54 |
| ▸ | LMNA | P02545 | 3/20 | 0.54 |
| ▸ | HTT | P42858 | 2/20 | 0.54 |
| ▸ | MAPT | P10636 | 3/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.54 |
| ▸ | HPGD | P15428 | 1/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.54 |
| ▸ | CES1 | P23141 | 1/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.54 |
| ▸ | MITF | O75030 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL698678 | 0.98 | KDM4E (0.79) | KDM4EKMT2AMEN1PABPC1RAB9A | |
| Hydrochloric Acid SCHEMBL2527501 | 0.98 | KMT2A (0.73) | KDM4EKMT2AMEN1PABPC1RAB9A | |
| Bromide SCHEMBL27941533 | 0.98 | KDM4E (0.79) | KDM4EKMT2AMEN1PABPC1RAB9A | |
| Ammonia Solution, Strong SCHEMBL28760030 | 0.98 | KDM4E (0.73) | KDM4EKMT2AMEN1PABPC1RAB9A | |
| SCHEMBL28520864 | 0.98 | KDM4E (0.73) | KDM4EKMT2AMEN1PABPC1RAB9A | |
| Bromide SCHEMBL27941532 | 0.98 | KDM4E (0.73) | KDM4EKMT2AMEN1PABPC1RAB9A | |
| SCHEMBL8825043 | 0.92 | KDM4E (0.72) | KDM4EKMT2AMEN1PABPC1RAB9A | |
| Oxalic Acid SCHEMBL4024677 | 0.92 | KDM4E (0.67) | KDM4EKMT2AMEN1PABPC1RAB9A | |
| Oxalic Acid SCHEMBL4026848 | 0.91 | KDM4E (0.65) | KDM4EKMT2AMEN1PABPC1RAB9A | |
| SCHEMBL13203515 | 0.88 | KDM4E (0.96) | KDM4EKMT2AMEN1PABPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 223 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115677267-A | Anti-shedding agent, anti-shedding bird-repelling asphalt mixture and preparation method thereof | 中国石油化工股份有限公司 | 2023-02-03 | — | — | CN | claimed |
| CN-114477835-A | Anti-flying powder, anti-flying flame-retardant asphalt mixture and preparation method thereof | 中国石油化工股份有限公司 | 2022-05-13 | — | — | CN | claimed |
| CN-114479489-A | Anti-stripping sulfur asphalt and preparation method and application thereof | 中国石油化工股份有限公司 | 2022-05-13 | — | — | CN | claimed |
| EP-0877298-B1 | Coated xerographic photographic paper | XEROX CORP (US) | 2001-08-29 | — | — | EP | claimed |
| JP-7070221-A | — | — | None | — | — | JP | disclosed |
| JP-7070068-A | — | — | None | — | — | JP | disclosed |
| EP-4748893-A1 | PHOTOCURABLE RESIN COMPOSITION, ADHESIVE, SEALING MATERIAL, COATING AGENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, AND CURING, BONDING, SEALING, AND COATING METHODS USING PHOTOCURABLE RESIN COMPOSITION | Namics Corporation (JP) | 2026-05-27 | — | — | EP | disclosed |
| US-20250115705-A1 | RESIN COMPOSITION FOR LENS, CURED SUBSTANCE FOR LENS, AND LENS | MITSUI CHEMICALS, INC. (JP) | 2025-04-10 | — | — | US | disclosed |
| EP-4462162-A1 | RESIN COMPOSITION FOR LENS, CURED PRODUCT FOR LENS, AND LENS | Mitsui Chemicals, Inc. (JP) | 2024-11-13 | — | — | EP | disclosed |
| WO-2024204692-A1 | RESIN COMPOSITION, TRANSPARENT MATERIAL, TRANSPARENT FILM, PLATE MATERIAL FOR SCREEN PRINTING, STENCIL FOR SCREEN PRINTING, AND PHOTOSENSITIVE RESIST FILM | 株式会社ムラカミ | 2024-10-03 | — | — | WO | disclosed |
| US-20240288772-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-08-29 | — | — | US | disclosed |
| CN-118284274-A | Charge-transporting varnish | 日产化学株式会社 | 2024-07-02 | — | — | CN | disclosed |
| JP-H0770068-A | PYRIDINIUM COMPLEX AND ITS USE | TOYO INK MFG CO LTD | 1995-03-14 | — | — | JP | disclosed |
| JP-H0770221-A | PRODUCTION OF POLYMERIZABLE COMPOSITION AND ITS CURED PRODUCT | TOYO INK MFG CO LTD | 1995-03-14 | — | — | JP | disclosed |
| US-5362607-A | Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt | MICROSI, INC. (US) | 1994-11-08 | — | — | US | disclosed |
| US-5310619-A | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable | MICROSI, INC. (US) | 1994-05-10 | — | — | US | disclosed |
| EP-0249139-A2 | Resist compositions and use | MicroSi, Inc. (a Delaware corporation) (US) | 1987-12-16 | — | — | EP | disclosed |
| CN-86108686-A | The production of anti-oxidizing compounds and purposes | — | 1987-09-16 | — | — | CN | disclosed |
| EP-0066543-B1 | THERMALLY POLYMERIZABLE COMPOSITIONS AND PROCESS FOR THE THERMAL POLYMERIZATION OF CATIONICALLY POLYMERIZABLE COMPOUNDS | CIBA-GEIGY AG (CH) | 1985-11-27 | — | — | EP | disclosed |
| EP-0005783-A1 | Imidazo (2.1-b)-(1.3.4)-thiadiazoles, process for their preparation and their use in medicaments | BAYER AG (DE) | 1979-12-12 | — | — | EP | disclosed |