⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL533226 | 0.82 | — | — | |
| SCHEMBL477720 | 0.78 | — | — | |
| SCHEMBL357391 | 0.78 | — | — | |
| SCHEMBL477969 | 0.78 | — | — | |
| SCHEMBL1450906 | 0.78 | — | — | |
| Hydrochloric Acid SCHEMBL28282660 | 0.78 | — | — | |
| Hydrochloric Acid SCHEMBL23577695 | 0.75 | — | — | |
| SCHEMBL27679024 | 0.75 | — | — | |
| SCHEMBL3382392 | 0.75 | — | — | |
| SCHEMBL10049926 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107849247-A | Method for producing photo-alignment layer | 株式会社LG化学 | 2018-03-27 | — | — | CN | claimed |
| CN-103946271-B | Passivating film formation composition comprising the resin with carbon-carbon multiple bond | 日产化学工业株式会社 | 2019-04-12 | — | — | CN | disclosed |
| EP-1954668-B9 | HOMO- AND HETEROCYCLIC COMPOUNDS SUITABLE AS CETP INHIBITORS | BRISTOL MYERS SQUIBB CO (US) | 2012-03-21 | — | — | EP | disclosed |
| EP-1954668-B1 | HOMO- AND HETEROCYCLIC COMPOUNDS SUITABLE AS CETP INHIBITORS | BRISTOL MYERS SQUIBB CO (US) | 2011-09-28 | — | — | EP | disclosed |