⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1927972 | 0.81 | — | — | |
| SCHEMBL420893 | 0.79 | — | — | |
| SCHEMBL1403443 | 0.71 | — | — | |
| SCHEMBL3224682 | 0.60 | — | — | |
| SCHEMBL9335399 | 0.60 | — | — | |
| SCHEMBL290556 | 0.60 | — | — | |
| SCHEMBL5247536 | 0.60 | — | — | |
| SCHEMBL22721286 | 0.60 | — | — | |
| SCHEMBL42375 | 0.59 | — | — | |
| SCHEMBL1401055 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 442 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| EP-4398285-A1 | ADHESIVE COMPOSITION, MULTILAYER BODY, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| CN-118295212-A | Composition for forming resist underlayer film containing glycol structure | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| US-20240218293-A1 | CLEANING AGENT COMPOSITION AND CLEANING METHOD | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| US-12025916-B2 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| US-20240201592-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| WO-2024128199-A1 | RELEASER COMPOSITION FOR PHOTOIRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR PHOTOIRRADIATION RELEASE | 日産化学株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122488-A1 | COMPOSITION FOR FORMING PROTECTIVE FILM | 日産化学株式会社 | 2024-06-13 | — | — | WO | disclosed |
| CN-118159910-A | Additive-containing silicon-containing resist underlayer film forming composition | 日产化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| US-20100137445-A1 | PLANT DISEASE CONTROL AGENT, AND PLANT DISEASE CONTROL METHOD | SUMITOMO CHEMICAL COMPANY ,LIMITED | 2010-06-03 | — | — | US | disclosed |
| EP-2179651-A1 | PLANT DISEASE CONTROL AGENT, AND PLANT DISEASE CONTROL METHOD | Sumitomo Chemical Company, Limited (JP) | 2010-04-28 | — | — | EP | disclosed |
| EP-2174931-A1 | AMIDE COMPOUND AND METHOD FOR CONTROLLING PLANT DISEASE USING THE SAME | Sumitomo Chemical Company, Limited (JP) | 2010-04-14 | — | — | EP | disclosed |
| US-20100022089-A1 | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSIAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20090311624-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20090281200-A1 | ORGANOSOL OF FLUORIDE COLLOID PARTICLE AND METHOD FOR PRODUCTION THEREOF | NISSAN CHEMICAL INDUSTRIAL, LTD. (JP) | 2009-11-12 | — | — | US | disclosed |
| CN-101523292-A | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSAN CHEMICAL IND LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| CN-101506736-A | Resist underlayer film forming composition containing liquid additive | NISSAN CHEMICAL IND LTD (JP) | 2009-08-12 | — | — | CN | disclosed |
| EP-2085823-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |
| EP-2085435-A1 | ORGANOSOL OF FLUORIDE COLLOID PARTICLE AND METHOD FOR PRODUCTION THEREOF | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |