Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11770599 | 0.87 | ALDH1A1 (0.37) | ALDH1A1TDP1SMN1; SMN2 | |
| SCHEMBL4924940 | 0.85 | ALDH1A1 (0.34) | ALDH1A1TDP1SMN1; SMN2TSHRMAPK1 | |
| SCHEMBL3795742 | 0.84 | ALDH1A1 (0.43) | ALDH1A1TDP1SMN1; SMN2TSHR | |
| SCHEMBL11765795 | 0.83 | ALDH1A1 (0.39) | ALDH1A1TDP1SMN1; SMN2TSHR | |
| SCHEMBL188215 | 0.81 | ALDH1A1 (0.35) | ALDH1A1TDP1SMN1; SMN2TSHRMAPK1 | |
| SCHEMBL229764 | 0.81 | ALDH1A1 (0.35) | ALDH1A1TDP1SMN1; SMN2TSHRMAPK1 | |
| SCHEMBL11764315 | 0.80 | SMN1; SMN2 (0.46) | ALDH1A1TDP1SMN1; SMN2TSHR | |
| SCHEMBL29375617 | 0.79 | ALDH1A1 (0.34) | ALDH1A1TDP1SMN1; SMN2TSHRMAPK1 | |
| SCHEMBL11766827 | 0.76 | ALDH1A1 (0.36) | ALDH1A1TDP1SMN1; SMN2 | |
| SCHEMBL5597326 | 0.76 | SMN1; SMN2 (0.31) | ALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 247 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115746616-A | Surface-modified hollow silica particles and surface-modified hollow silica dispersion | 凯斯科技股份有限公司 | 2023-03-07 | — | — | CN | claimed |
| CN-112831206-A | Inorganic oxide dispersion with controllable water content and preparation method thereof | 凯斯科技股份有限公司 | 2021-05-25 | — | — | CN | claimed |
| CN-119948595-A | Method for producing semiconductor device containing low dielectric constant film | 彼博股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| CN-119768742-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-119563142-A | Composition for forming silicon-containing resist underlayer film containing multifunctional sulfonic acid | 日产化学株式会社 | 2025-03-04 | — | — | CN | disclosed |
| CN-119487453-A | Method for manufacturing laminate and method for manufacturing semiconductor element | 日产化学株式会社 | 2025-02-18 | — | — | CN | disclosed |
| CN-112947000-B | Composition for forming silicon-containing EUV resist underlayer film containing sulfonate | 日产化学工业株式会社 | 2024-11-29 | — | — | CN | disclosed |
| CN-113165888-B | Spherical forsterite particles, process for producing the same, and resin composition containing the same | 日产化学株式会社 | 2024-11-19 | — | — | CN | disclosed |
| CN-118843834-A | Composition for forming wafer edge protection film for semiconductor manufacturing | 日产化学株式会社 | 2024-10-25 | — | — | CN | disclosed |
| CN-118742855-A | Photocurable resin composition containing self-crosslinkable polymer | 日产化学株式会社 | 2024-10-01 | — | — | CN | disclosed |
| CN-113015940-B | Silanol-containing organic-inorganic hybrid coatings for high resolution patterning | 彼博股份有限公司 | 2024-09-13 | — | — | CN | disclosed |
| US-6001164-A | AS MICROFILLERS TO BE USED AS HARD COATING AGENT WITH HIGH REFRACTIVE INDEX TO BE APPLIED ON SURFACE OF PLASTIC LENSES, FILMS OR PLASTIC MOLDED PRODUCTS, OR MAY BE MIXED WITH VARIOUS RESIN EMULSIONS FOR USE AS FLAME RETARDANTS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 1999-12-14 | — | — | US | disclosed |
| EP-0927700-A1 | Method of producing anhydrous zinc antimonate | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1999-07-07 | — | — | EP | disclosed |
| EP-0909784-A1 | Anhydrous zinc antimonate sol and method for producing the same | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 1999-04-21 | — | — | EP | disclosed |
| US-5891362-A | DISPERSED IN LIQUID | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 1999-04-06 | — | — | US | disclosed |
| EP-0748768-A1 | Hydrated zinc stannate sols, coating compositions and optical elements | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1996-12-18 | — | — | EP | disclosed |
| EP-0526975-B1 | Coating composition for optical plastic moldings | ITOH OPTICAL IND (JP) | 1995-07-26 | — | — | EP | disclosed |
| US-5322888-A | Curable mixture of hydrolyzable silicate, epoxy-containing silane, dicarboxylic acid or anhydride, and imidazole catalyst; protective coating for optical substrate having a high refractive index; radiation resistance | ITOH OPTICAL INDUSTRIAL CO., LTD. (JP) | 1994-06-21 | — | — | US | disclosed |
| EP-0526975-A2 | Coating composition for optical plastic moldings | ITOH OPTICAL INDUSTRIAL CO., LTD. (JP) | 1993-02-10 | — | — | EP | disclosed |
| US-4026826-A | ALKOXYSILANES | JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JA) | 1977-05-31 | — | — | US | disclosed |