SCHEMBL229764

SCHEMBL229764

CO[Si](C)(CC(C)OCC1CO1)OC

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.35
TSHR P16473 2/20 0.33
MAPK1 P28482 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
TP53 P04637 1/20 0.30
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL188215 0.85 ALDH1A1 (0.35) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL229592 0.82 SMN1; SMN2 (0.34) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL5605973 0.82 ALDH1A1 (0.33) ALDH1A1TSHRMAPK1SMN1; SMN2TP53
SCHEMBL767366 0.81 ALDH1A1 (0.35) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL27845450 0.80 ALDH1A1 (0.33) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL4361383 0.80 SMN1; SMN2 (0.40) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL28516800 0.80 ALDH1A1 (0.35) ALDH1A1
SCHEMBL28906298 0.79 ALDH1A1 (0.36) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL5606106 0.79 ALDH1A1 (0.35) ALDH1A1TSHRMAPK1SMN1; SMN2TDP1
SCHEMBL11770599 0.78 ALDH1A1 (0.37) ALDH1A1SMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 550 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230348750-A1 LOW INTERFERENCE FRINGE OPTICAL ARTICLE AND COATING AGENT COMPOSITION THEREOF NIPPON FINE CHEMICAL CO., LTD. (JP) 2023-11-02 US claimed
CN-115746616-A Surface-modified hollow silica particles and surface-modified hollow silica dispersion 凯斯科技股份有限公司 2023-03-07 CN claimed
CN-112831206-A Inorganic oxide dispersion with controllable water content and preparation method thereof 凯斯科技股份有限公司 2021-05-25 CN claimed
US-10208209-B2 Aqueous agent and coating method for the anticorrosive treatment of metallic substrates THYSSENKRUPP STEEL EUROPE AG (DE) 2019-02-19 US claimed
EP-2743376-B1 Aqueous agent and coating method for the corrosion protection treatment of metal substrates ALUFINISH GES FÜR VERFAHRENSTECHNIK UND SPEZIALFABRIKATION VON PRODUKTEN ZUR METALLOBERFLÄCHENBEHAND (DE) 2017-10-18 EP claimed
US-20160024309-A1 AQUEOUS AGENT AND COATING METHOD FOR THE ANTICORROSIVE TREATMENT OF METALLIC SUBSTRATES THYSSENKRUPP STEEL EUROPE AG (DE) 2016-01-28 US claimed
WO-2014090752-A1 AQUEOUS AGENT AND COATING METHOD FOR THE ANTICORROSIVE TREATMENT OF METALLIC SUBSTRATES ALUFINISH GESELLSCHAFT FÜR VERFAHRENSTECHNIK UND SPEZIALFABRIKATION VON PRODUKTEN ZUR METALLOBERFLÄCHENBEHANDLUNG MBH & CO. KG (DE) 2014-06-19 WO claimed
EP-2743376-A1 Aqueous agent and coating method for the corrosion protection treatment of metal substrates Alufinish Gesellschaft für Verfahrenstechnik und Spezialfabrikation von Produkten zur Metalloberflächenbehandlung mbH & Co. KG (DE) 2014-06-18 EP claimed
US-20020127330-A1 Organic-inorganic hybrid polymer and method of making same JIN DAN L (US) 2002-09-12 US claimed
US-20010036554-A1 Organic-incorganic hybrid polymer and method of making same NANOFILM LTD 2001-11-01 US claimed
EP-1136520-A2 Organic- inorganic hybrid polymer and method of making the same nanoFILM, Ltd. (US) 2001-09-26 EP claimed
US-6391433-B1 None US disclosed
CN-119948595-A Method for producing semiconductor device containing low dielectric constant film 彼博股份有限公司 2025-05-06 CN disclosed
CN-112368641-B Photosensitive resin composition, photosensitive sheet, cured film thereof, method for producing cured film, and electronic component 东丽株式会社 2025-05-02 CN disclosed
CN-119768742-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2025-04-04 CN disclosed
EP-0195493-A2 Transparent article and process for preparation thereof TORAY INDUSTRIES, INC. (JP) 1986-09-24 EP disclosed
US-4590117-A HARDENED LAYERS OF OXIDES OF ALUMINUM, TITANIUM AND/OR ZIRCONIUM AND A POLYSILOXANE; DYEABILITY; LENS TORAY INDUSTRIES, INC. (JP) 1986-05-20 US disclosed
US-4529659-A Magnetic recording member and process for manufacturing the same NIPPON TELEGRAPH & TELEPHONE PUBLIC CORPORATION (JP) 1985-07-16 US disclosed
EP-0119331-A1 Transparent material having antireflective coating TORAY INDUSTRIES, INC. (JP) 1984-09-26 EP disclosed
US-4026826-A ALKOXYSILANES JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JA) 1977-05-31 US disclosed