⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7191717 | 0.83 | — | — | |
| SCHEMBL4404945 | 0.74 | CYP2D6 (0.32) | — | |
| SCHEMBL8613888 | 0.70 | SLC6A4 (0.31) | — | |
| SCHEMBL7638347 | 0.69 | HPSE (0.33) | — | |
| SCHEMBL6727387 | 0.69 | — | — | |
| SCHEMBL8466389 | 0.67 | — | — | |
| SCHEMBL7682091 | 0.65 | — | — | |
| SCHEMBL7696960 | 0.65 | — | — | |
| SCHEMBL9802837 | 0.65 | — | — | |
| SCHEMBL15387666 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20020091216-A1 | Novel photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-07-11 | — | — | US | claimed |
| US-20020091216-A1 | Novel photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-07-11 | — | — | US | disclosed |