SCHEMBL7684065

SCHEMBL7684065

COC(O)C1CC2C=CC1C2

nearest known ligand 0.35

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
GAA P10253 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
KDM4E B2RXH2 1/20 0.32
LMNA P02545 1/20 0.32
NPC1 O15118 1/20 0.31
RECQL P46063 1/20 0.31
RAB9A P51151 1/20 0.31
EPHX2 P34913 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7681209 0.79 KDM4E (0.33) ALDH1A1KDM4ELMNA
SCHEMBL17121959 0.79 KDM4E (0.34) ALDH1A1KDM4ELMNA
SCHEMBL4787655 0.78 KDM4E (0.30) ALDH1A1KDM4E
SCHEMBL1088788 0.77 NPC1 (0.36) ALDH1A1GAATDP1KDM4ELMNA
SCHEMBL7674862 0.77
SCHEMBL7678548 0.77 KDM4E (0.32) ALDH1A1KDM4E
SCHEMBL4608572 0.76 KDM4E (0.38) ALDH1A1GAATDP1KDM4ELMNA
SCHEMBL17120348 0.76 KDM4E (0.30) ALDH1A1KDM4ELMNA
SCHEMBL7682592 0.74
SCHEMBL7683404 0.74 KDM4E (0.30) ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6359153-B1 Photoresist monomers and preparation thereof HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-03-19 US claimed
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed
US-20160363866-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-15 US disclosed
US-20160363866-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-15 US disclosed
US-7524977-B2 Process for producing fluoroalkanesulfonamide derivatives CENTRAL GLASS COMPANY, LIMITED (JP) 2009-04-28 US disclosed
US-20080058538-A1 Process for producing fluoroalkanesulfonamide derivatives CENTRAL GLASS COMPANY, LIMITED (JP) 2008-03-06 US disclosed
US-6359153-B1 Photoresist monomers and preparation thereof HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-03-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080058538-A1 Process for producing fluoroalkanesulfonamide derivatives AFF1, AFF2, RER1 ALDH1A1 467/4885GAA 1456/4885TDP1 3304/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.