SCHEMBL7694863

SCHEMBL7694863

C=C(C(=O)O)C(C)C=C(C(=O)O)C(C=C(C)C(=O)O)CCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7698868 0.92
SCHEMBL7061679 0.89 ACHE (0.34)
SCHEMBL4477399 0.86 LCK (0.36)
SCHEMBL4477552 0.86 LCK (0.36)
SCHEMBL8037104 0.82
Ethylene Glycol SCHEMBL17448279 0.78
SCHEMBL8673348 0.75 CA2 (0.33)
SCHEMBL358281 0.75 HPGD (0.31)
SCHEMBL8506548 0.74 LCK (0.37)
SCHEMBL693962 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6348432-B1 COPOLYMER CONTAINING METHYL METHACRYLATE AND (METH)ACRYLIC ACID MONOMERS; (THIO)FLUORAN, SPIROPYRAN, TRIARYLMETHANE, XANTHENE, OR METHINE COLOR FORMER; AND DEVELOPER; COATING; HEAT ACTIVATING; FREE OF PROTECTIVE COATING NASHUA CORPORATION 2002-02-19 US claimed
WO-2000053428-A1 HEAT-SENSITIVE COATING CONTAINING ACRYLATE COPOLYMER, RECORDING MATERIAL AND METHODS OF MANUFACTURE NASHUA CORPORATION (US) 2000-09-14 WO claimed
US-6348432-B1 COPOLYMER CONTAINING METHYL METHACRYLATE AND (METH)ACRYLIC ACID MONOMERS; (THIO)FLUORAN, SPIROPYRAN, TRIARYLMETHANE, XANTHENE, OR METHINE COLOR FORMER; AND DEVELOPER; COATING; HEAT ACTIVATING; FREE OF PROTECTIVE COATING NASHUA CORPORATION 2002-02-19 US disclosed
WO-2000053428-A1 HEAT-SENSITIVE COATING CONTAINING ACRYLATE COPOLYMER, RECORDING MATERIAL AND METHODS OF MANUFACTURE NASHUA CORPORATION (US) 2000-09-14 WO disclosed