SCHEMBL7696384

SCHEMBL7696384

C=C(C(=O)Oc1ccccc1)C(Cl)Cl

nearest known ligand 0.45

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ELANE P08246 4/20 0.45
ATM Q13315 3/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
TDP1 Q9NUW8 2/20 0.44
HSD17B10 Q99714 2/20 0.39
ALOX15 P16050 2/20 0.39
HPGD P15428 2/20 0.39
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
MAPT P10636 3/20 0.37
KDM4E B2RXH2 1/20 0.37
NSD2 O96028 1/20 0.37
SLC1A3 P43003 1/20 0.37
LMNA P02545 1/20 0.36
XBP1 P17861 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
ALDH1A1 P00352 1/20 0.35
CYP19A1 P11511 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9747672 0.85 ELANE (0.42) ELANEATML3MBTL1TDP1HSD17B10
SCHEMBL9747622 0.82 ELANE (0.41) ELANEATML3MBTL1TDP1HSD17B10
SCHEMBL9746928 0.81 ELANE (0.45) ELANEATML3MBTL1TDP1HSD17B10
SCHEMBL9745967 0.81 ELANE (0.45) ELANEATML3MBTL1TDP1HSD17B10
SCHEMBL8080216 0.81 ELANE (0.49) ELANEATML3MBTL1TDP1HSD17B10
SCHEMBL5081333 0.79 ELANE (0.47) ELANEATML3MBTL1TDP1HSD17B10
SCHEMBL10006804 0.78 GAA (0.50) ELANEATMTDP1HPGDNPC1
SCHEMBL9574928 0.78 ELANE (0.46) ELANEATML3MBTL1TDP1HSD17B10
SCHEMBL9746038 0.78 ELANE (0.42) ELANEATML3MBTL1TDP1HSD17B10
SCHEMBL13817458 0.78 HPGD (0.58) ELANEATML3MBTL1TDP1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6342627-B1 ESTER INTERCHANGE WITH ALCOHOL IN THE PRESENCE OF LANTHANOIDE METAL ALKOXIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-29 US disclosed
US-5100762-A Radiation-sensitive polymer and radiation-sensitive composition containing the same MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1992-03-31 US disclosed