SCHEMBL7709107

SCHEMBL7709107

CC(C)CO[Ti](OCC(C)C)(OC(C)C)OC(C)C

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL50405 0.82 ALDH1A1 (0.36) ALDH1A1
SCHEMBL10789885 0.74 LMNA (0.32)
SCHEMBL1987476 0.74 ALDH1A1 (0.32) ALDH1A1
SCHEMBL1988230 0.74 ALDH1A1 (0.32) ALDH1A1
SCHEMBL1988359 0.74 ALDH1A1 (0.32) ALDH1A1
SCHEMBL1986380 0.72 ALDH1A1 (0.31) ALDH1A1
SCHEMBL1989107 0.72 ALDH1A1 (0.31) ALDH1A1
SCHEMBL1993223 0.72 ALDH1A1 (0.31) ALDH1A1
SCHEMBL15774 0.71
SCHEMBL4694513 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10730272-B2 Heat-ray shielding film, heat-ray shielding laminated transparent substrate, automobile, building, dispersoid, mixed composition, method for manufacturing dispersoid, dispersion liquid, and method for manufacturing dispersion liquid SUMITOMO METAL MINING CO., LTD. (JP) 2020-08-04 US disclosed
US-20180170021-A1 HEAT-RAY SHIELDING FILM, HEAT-RAY SHIELDING LAMINATED TRANSPARENT SUBSTRATE, AUTOMOBILE, BUILDING, DISPERSOID, MIXED COMPOSITION, METHOD FOR MANUFACTURING DISPERSOID, DISPERSION LIQUID, AND METHOD FOR MANUFACTURING DISPERSION LIQUID SUMITOMO METAL MINING CO., LTD. (JP) 2018-06-21 US disclosed
EP-3318610-A1 HEAT-RAY SHIELDING FILM, HEAT-RAY SHIELDING LAMINATED TRANSPARENT BASE MATERIAL, AUTOMOBILE, BUILDING, DISPERSION, MIXED COMPOSITION, DISPERSION PRODUCTION METHOD, DISPERSION SOLUTION, AND DISPERSION SOLUTION PRODUCTION METHOD Sumitomo Metal Mining Co., Ltd. (JP) 2018-05-09 EP disclosed
US-20160291470-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM, AND ELEMENT HAVING PROTECTIVE FILM CHI MEI CORPORATION (TW) 2016-10-06 US disclosed
US-9093279-B2 Thin film forming composition for lithography containing titanium and silicon NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-07-28 US disclosed
EP-2735904-A1 THIN FILM FORMATION COMPOSITION FOR LITHOGRAPHY WHICH CONTAINS TITANIUM AND SILICON Nissan Chemical Industries, Ltd. (JP) 2014-05-28 EP disclosed
US-20140120730-A1 THIN FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING TITANIUM AND SILICON NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-05-01 US disclosed
US-6355097-B2 FORMING DIELECTRICS MITSUBISHI MATERIALS CORPORATION (JP) 2002-03-12 US disclosed
US-20010050028-A1 Novel organic titanium compound suitable for MOCVD MITSUBISHI MATERIALS CORPORATION (JP) 2001-12-13 US disclosed
US-6280518-B1 MIXTURE OF ORGANOMETALLIC COMPOUND AND SOLVENT MITSUBISHI MATERIALS CORPORATION (JP) 2001-08-28 US disclosed