⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19283225 | 0.85 | APP (0.42) | — | |
| SCHEMBL11053633 | 0.78 | — | — | |
| SCHEMBL8639242 | 0.77 | — | — | |
| SCHEMBL12212850 | 0.77 | — | — | |
| SCHEMBL119163 | 0.74 | — | — | |
| SCHEMBL11508244 | 0.73 | PTGS1 (0.33) | — | |
| SCHEMBL496774 | 0.72 | — | — | |
| SCHEMBL8312882 | 0.72 | — | — | |
| SCHEMBL418534 | 0.71 | PTGS1 (0.53) | — | |
| Hydrochloric Acid SCHEMBL5066620 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0123159-B1 | POSITIVE-WORKING PHOTOSENSITIVE BENZOIN ESTERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-09-05 | — | — | EP | claimed |
| EP-0123159-A2 | Positive-working photosensitive benzoin esters | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-10-31 | — | — | EP | claimed |
| US-4469774-A | RELIEF PRINTING PLATES, PHOTORESISTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-09-04 | — | — | US | claimed |
| US-6372765-B1 | SKIN PARASITES TREATED WITH SOLVENT | BAYER AKTIENGESELLSCHAFT (DE) | 2002-04-16 | — | — | US | disclosed |
| US-5004674-A | Organic compound which releases a free radical on contact with light rays and a compound which changes in absorption spectra due to free radical in a layer on a support | FUJI PHOTO FILM CO., LTD. (JP) | 1991-04-02 | — | — | US | disclosed |
| EP-0123159-B1 | POSITIVE-WORKING PHOTOSENSITIVE BENZOIN ESTERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-09-05 | — | — | EP | disclosed |
| EP-0123159-A2 | Positive-working photosensitive benzoin esters | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-10-31 | — | — | EP | disclosed |
| US-4469774-A | RELIEF PRINTING PLATES, PHOTORESISTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-09-04 | — | — | US | disclosed |
| US-4152189-A | Method of utilizing polyacrylic hot-melt adhesives | ROHM AND HAAS COMPANY (US) | 1979-05-01 | — | — | US | disclosed |
| US-4147850-A | ACRYLATE, UNSATURATED AMINE OR ACID, WATER | ROHM AND HAAS COMPANY (US) | 1979-04-03 | — | — | US | disclosed |
| US-4065523-A | COPOLYMERIZATION | ROHM AND HAAS COMPANY (US) | 1977-12-27 | — | — | US | disclosed |
| US-4045517-A | Polyacrylic hot melt adhesives | ROHM AND HAAS COMPANY (US) | 1977-08-30 | — | — | US | disclosed |